An optical reticle inspection tool is used during an inspection to obtain, for each local area, an average of multiple reflected intensity values corresponding to light reflected from a plurality of sub-areas of each local area of the reticle. The optical reticle inspection tool is also used during the inspection to obtain, for each local area, an average of multiple transmitted intensity values corresponding to light transmitted through the sub-areas of each local area of the reticle. A combined intensity map is generated by combining, for each local area, the average of multiple reflected intensity values and the average of multiple transmitted intensity values such that a reticle pattern of the reticle is cancelled from the combined intensity map if the reticle has not degraded and such that the reticle pattern of the reticle is not cancelled out of the combined intensity map if the reticle has degraded.

Using reflected and transmission maps to detect reticle degradation

With an optical inspection tool, images of a plurality of patches of a plurality of dies of a reticle are obtained. The patch images are obtained so that each patch image is positioned relative to a same reference position within its respective die as another die-equivalent one of the patch images in each the other ones of the dies. For each patch image, an integrated value is determined for an image characteristic of sub-portions of such patch image. For each patch image, a reference value is determined based on the integrated values of the patch image's corresponding die-equivalent patch images. For each patch image, a difference between that patch image's integrated value and an average or median value of its die-equivalent patch images is determined whereby a significant difference indicates a variance in a pattern characteristic of a patch and an average or median pattern characteristic of its die-equivalent patches.

Delta die intensity map measurement

According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.

Pattern characteristic-detection apparatus for photomask and pattern characteristic-detection method for photomask

PROBLEM TO BE SOLVED: To provide a device and method for detecting the characteristics of a photomask. SOLUTION: The device for detecting the characteristics of the photomask is equipped with a detection data forming part for forming detection data on the basis of the optical image of the pattern formed to an object to be detected, a reference data forming part for forming the reference data related to the pattern, an extraction part for extracting the reference pattern corresponding to a pattern becoming a detection target of characteristics and the position data of the reference pattern from the reference data, a first region setting part for setting a region where the characteristics are detected on the basis of the reference pattern and extracting the pattern becoming the detection target of the characteristics from the detection data on the basis of the position data, a detection part for detecting the characteristics of the pattern becoming the detection target of the characteristics in the region where the characteristics are detected by photoelectrically converting the optical image formed on a light detection surface and a totalization part for totalizing the detected characteristics. COPYRIGHT: (C)2011,JPO&INPIT

Device and method for detecting characteristics of photomask

PROBLEM TO BE SOLVED: To provide an inspection device for an aperture pattern which is advantageous in irradiating the entire surface area of a body to be inspected with oblique light of a shallow angle to a deep angle. SOLUTION: When the body 20 to be inspected such as a photomask is mounted on a stage 34 for the inspection device, the top surface of the body 20 to be inspected is exposed above a support member 14 and the bottom surface of the body 20 to be inspected is exposed below the support member 14. Consequently, a large inspection light movable range is obtained by a light source 30 from the shallow angle to the deep angle, so inspection with a high degree of freedom can be performed during transmission/reflection measurement requiring irradiation with oblique light and the body to be inspected can be positioned at the outer peripheral margin part of a plane and at a thickness-directional section part, so inspection over the entire surface except for the outer peripheral margin part of the plane becomes possible and the body to be inspected can accurately be positioned, thereby improving reproducibility of a position. COPYRIGHT: (C)2008,JPO&INPIT

Inspection device for aperture pattern

PROBLEM TO BE SOLVED: To carry out a mask defect inspection in a short period of time with high accuracy SOLUTION: The apparatus is equipped with: an inspection area operation section 51 to operate the inspection area around a segment functioning to seam drawn images from the drawing data of a mask; a pixel setting section 52 to divide the inspection area operated by the inspection area operation section 51 into a plurality of pixels; a reflected image deciding section 53 to take in the reflected image on the mask surface in the inspection area and to decide whether possibility of failure is present or not in the segment; and a segment deciding section 54 to take in the translucent image of the mask in the inspection area when possibility of failure is decided to be present in the segment by the reflective image deciding section 53 and to compare the taken-in image with a preliminarily taken in reference image by each pixel unit to decide whether failure in the segment is present or not COPYRIGHT: (C)2006,JPO&NCIPI

孝小野

Papers

Mask inspection apparatus and mask inspection method

孝 小野

Papers

Mask inspection apparatus and mask inspection method

孝小野