The present invention includes ultraviolet curable compositions preferably containing discrete, crystalline zirconia nanoparticles with reactive, or copolymerizable, surface modification, in a polymerizable monomer/oligomer resin mixture. It is believed that copolymerizable surface modification provides a functional group that enables the functionalized particle to co-polmerize with the reactive monomers, oligomers, and crosslinkers in the formulation. Relative to surface modifation of the nanoparticles, acrylate functionality is preferred over methacrylate functionality. On the other hand, methacrylate functionality is preferred over non-reactive, or nonpolymerizable, functionality. As the nanocomposite cures, the resultant network is heavily crosslinked by selection of raw materials with substantial acrylate functionality.

Durable high index nanocomposites for ar coatings

A cholesteric polymerizable liquid crystal composition excellent in UV curing property and alignment property is provided The polymerizable liquid crystal composition contains at least one liquid crystal compound selected from compounds represented by Formula (1-1) and Formula (1-2), at least one liquid crystal compound selected from compounds represented by Formula (2), and 5 to 15% by weight of at least one optically active compound selected from compounds represented by Formula (4) and may contain at least one liquid crystal compound selected from compounds represented by Formula (3) The meanings of the symbols in the Formulae are described in the specification

Polymerizable liquid crystal composition

There is provided a photosensitive resin composition comprising:
 (a) 100 parts by weight of a polyorganosiloxane obtained by a method of combining at least one silanol compound represented by the following formula (1): R 1 2 Si(OH) 2   (1) {the groups in the formula being defined in the claims}, at least one alkoxysilane compound represented by the following formula (2): R 2 a R 3 b Si(OR 4 ) 4-a-b   (2) {the groups in the formula being defined in the claims} and a catalyst, and polymerizing them without active addition of water;
 (b) 1-50 parts by weight of a photopolymerization initiator; (c) 40-600 parts by weight of a fluorene compound represented by the following formula (3): {the groups in the formula being defined in the claims}; and
 (d) 20-300 parts by weight of a compound other than component (c), having one or two (meth)acryloyl groups in the molecule

Photosensitive resin composition

A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.

Compound for resist and radiation-sensitive composition

Material for forming an underlayer film for lithography, which has a high carbon concentration, a low oxygen concentration, a relatively high heat resistance and also a relatively high solvent solubility, and which can be applied to a wet process is disclosed. Material for forming an underlayer film for lithography contains a compound represented by general formula (1).

Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method

PROBLEM TO BE SOLVED: To obtain a fluorene-based composition having excellent diepersibility of an additive and capable of making the additive exhibit its function, by mixing a small amount of a fluorene compound into the composition, and to obtain a molded product of the same. SOLUTION: This fluorene-based composition contains the compound expressed by formula (I) [X 1 and X 2 are identical to or different from each other and are each a hydroxy, -O(AO) p H (A is a 2-3C alkylene; and p is an integer of 1 or more), amino or an N-monosubstituted amino; R 1 to R 4 are identical to or different from each other and are each a nonreactive group; m1 and m2 are identical to or different from each other and are each 0 or an integer of 1 to 3, and (m1+m2) is an integer of 1 to 6; and n1 to n4 are identical to or different from each other and are each an integer of 0 to 4; provided that (m1+n1) and (m2+n2) are each an integer of 0 to 5] or its derivative and the additive. The molded product is formed by using the composition. COPYRIGHT: (C)2005,JPO&NCIPI

Fluorene-based composition and molded product of the same

Fluorenone and a phenolic compound (eg, a 2-C1-4alkylphenol) is subjected to a condensation reaction in coexistence with a thiol compound and a hydrochloric acid aqueous solution to produce a fluorene derivative [eg, 9,9-bis(C1-4alkylhydroxyphenyl)fluorene] The proportion (weight ratio) of fluorenone relative to the thiol compound [fluorenone/the thiol compound] is about 1/001 to 1/05, and the proportion (weight ratio) of the thiol compound relative to hydrochloric acid (HCl) in the hydrochloric acid aqueous solution [the thiol compound/hydrochloric acid] is about 1/01 to 1/3 As the thiol compound, a mercaptocarboxylic acid (β-mercaptopropionic acid) may be used According to the method, a highly purified fluorene derivative excellent in transparency can be obtained inexpensively and simply without using a hydrogen chloride gas having handling difficulty

Method for producing fluorene derivative

PROBLEM TO BE SOLVED: To obtain a polyester polymer excellent in heat resistance and mechani cal strengths by incorporating fluorene structures and polysilane structures into the polymer molecule. SOLUTION: This polyester polymer is represented by formula I (wherein X is an aliphatic or aromatic hydrocarbon residue, preferably cycloakylene or arylene; Y is a group of formula II; R1 to R4 are each H or 1-4C alkyl; p is 2-4; Z is a group of formula III; R5 and R6 are each H, alkyl, aryl, or silyl; q is 2-100; a is 2-10; and l, m, and n are each 2 or higher. Preferably, the wt. average mol.wt. of the polymer is 1,000 or higher. The polymer can be produced by the polycondensation of a dimethyl dicarboxylate of formula IV, an alkylene glycol of the formula: HO(CH2)aOH, a fluorene compound of formula V, and a polysilane of formula VI. The polymer is excellent in the balance between strength and heat resistance because the polymer contains fluorene structures, which are hard segments having cardo structures and provide heat resistance, and polysilane structures, which are soft segments and provide mechanical strengths.

Polyester polymer and its production

PROBLEM TO BE SOLVED: To obtain a resin composition simply imparting excellent functions such as high refractive index and moldable SOLUTION: The resin composition is composed of a compound having a fluorene skeleton represented by formula (1) awherein, R 1 to R 4 denote each a nonreactive group or a reactive group; k1 and k2 denote each an integer of 1-5; m1 and m2 are each the same or different and denote each 0 or an integer of 1-4; and groups R 1 and R 2 may each be an alkyl group, an aryl group, an aralkyl group, hydroxy group, an amino group or a group [X-(R 5 O) n -Y] (wherein, R 5 is an alkylene group; group X is oxygen atom or an imino group; group Y is hydrogen atom, a glycidyl group or an acryloyl or a methacrylol group; and (n) denotes an integer of 0 or ≥1)} and a thermoplastic resin (an aromatic ring-containing resin, or the like, such as a polycarbonate resin) COPYRIGHT: (C)2005,JPO&NCIPI

Fluorene skeleton-containing resin composition and molded product therefrom

PROBLEM TO BE SOLVED: To provide a method for easily and efficiently producing uncolored high-purity bisphenolfluorenes with a high clarity. SOLUTION: Fluorenone is condensed with a phenol [e.g. 2-(1-4C)alkylphenol] in the presence of a thiol compound (e.g. β-mercaptopropionic acid) and sulfuric acid; then, the resultant reaction mixture is neutralized and is freed of an aqueous phase to give an organic layer; and a crystallization solvent comprising a hydrocarbon (e.g. toluene) and a polar solvent [e.g. a ketone (e.g. acetone), an alcohol, or a nitrile] is added to the organic layer to precipitate crystals, giving a bisphenolfluorene [e.g. 9,9-bis(1-4C-alkylhydroxyphenyl)fluorene]. COPYRIGHT: (C)2003,JPO

Yasuhiro Suda

Papers

Fluorene-based composition and molded product of the same

Method for producing fluorene derivative

Polyester polymer and its production

Fluorene skeleton-containing resin composition and molded product therefrom

Production method for bisphenolfluorenes