Process gas discharged from a bypass pipe to a gas exhaust system can be prevented from diffusing back to the inside of a process chamber without having to install a dedicated vacuum pump at the downstream side of the bypass pipe. The substrate processing apparatus includes a process chamber accommodating a substrate, a gas supply system supplying process gas from a process gas source to the process chamber for processing the substrate, a gas exhaust system configured to exhaust the process chamber, two or more vacuum pumps installed in series at the gas exhaust system, and a bypass pipe connected between the gas supply system and the gas exhaust system. The most upstream one of the vacuum pumps is a mechanical booster pump, and the bypass pipe is connected between the mechanical booster pump and the rest vacuum pumps located at a downstream side of the mechanical booster pump.

Substrate Processing Apparatus

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.

Projection optical system and method for photolithography and exposure apparatus and method using same

Systems and methods for making and using handheld data readers comprising one or more fluid lenses. One or more fluid lenses are provided to allow a handheld data reader to perform such operations as reading indicia, including such additional operations as zooming, reorienting a viewing direction, focusing, adjusting an optical axis, and correcting for the effects of motion such as hand jitter. The fluid lens or lenses can be operated for example by applying electrical signals to fluid lenses comprising a plurality of fluids including at least one that is conductive and at least one that is non-conductive.

Data reader apparatus having an adaptive lens

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

Method and apparatus for angular-resolved spectroscopic lithography characterization

A lithographic apparatus according to the present invention, an illumination system configured to condition a radiation beam; Support configured to impart the radiation beam with a pattern in its cross-section to support a patterning device that can form a patterned radiation beam; A substrate table configured to hold a substrate; A projection system configured to project the patterned radiation beam onto a target portion of the substrate; A final element of said projection system and a liquid supply system configured to fill a space between the substrate in at least partially liquid; A seal member arranged substantially to contain said liquid within said space between said final element of the projection system and the substrate; And it includes elements for controlling and / or compensate for evaporation of immersion liquid from the substrate.

요한네스 헨리쿠스 빌헬무스 야콥스

Papers

Lithographic Apparatus and Device Manufacturing Method