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Yoshihiro Minami
Researcher at Toshiba
Publications - 43
Citations - 1453
Yoshihiro Minami is an academic researcher from Toshiba. The author has contributed to research in topics: Dram & Semiconductor device. The author has an hindex of 21, co-authored 43 publications receiving 1437 citations.
Papers
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Proceedings ArticleDOI
Floating Body RAM Technology and its Scalability to 32nm Node and Beyond
Tomoaki Shino,Naoki Kusunoki,Tomoki Higashi,Takashi Ohsawa,Katsuyuki Fujita,Kosuke Hatsuda,Nobuyuki Ikumi,Fumiyoshi Matsuoka,Y. Kajitani,Ryo Fukuda,Yohji Watanabe,Yoshihiro Minami,A. Sakamoto,J. Nishimura,M. Nakajima,Mutsuo Morikado,K. Inoh,Takeshi Hamamoto,Akihiro Nitayama +18 more
TL;DR: Device simulation proves that the floating body cell is scalable to the 32nm node keeping signal margin (threshold voltage difference) and data retention time constant.
Proceedings ArticleDOI
Autonomous refresh of floating body cell (FBC)
Takashi Ohsawa,Ryo Fukuda,Tomoki Higashi,Katsuyuki Fujita,Fumiyoshi Matsuoka,Tomoaki Shino,H. Furuhashi,Yoshihiro Minami,Hiroomi Nakajima,Takeshi Hamamoto,Yohji Watanabe,Akihiro Nitayama,Tohru Furuyama +12 more
TL;DR: In this article, the physics of autonomous refresh of FBC is presented, where current input to the floating body by impact ionization and output by charge pumping can balance to make FBC refresh by itself without sense amplifier operation.
Proceedings ArticleDOI
FBC (Floating Body Cell) for embedded DRAM on SOI
K. Inoh,Tomoaki Shino,Hiroaki Yamada,Hiroomi Nakajima,Yoshihiro Minami,T. Yamada,Takashi Ohsawa,Tomoki Higashi,Katsuyuki Fujita,Tamio Ikehashi,Takeshi Kajiyama,Yoshiaki Fukuzumi,Takeshi Hamamoto,Hidemi Ishiuchi +13 more
TL;DR: In this paper, the memory cell characteristics of the FBC (Floating Body Cell) have been experimentally verified by 0.175 /spl mu/m cell array for the first time.
Patent
Semiconductor device having one of patterned SOI and SON structure
Takashi Yamada,Tsutomu Sato,Shinichi Nitta,Hajime Nagano,Ichiro Mizushima,Hisato Oyamatsu,Yoshihiro Minami,Shinji Miyano,Osamu Fujii +8 more
Abstract: A semiconductor device includes first and second semiconductor layers and first and second MOS transistors. The first semiconductor layer is provided on and electrically connected to the semiconductor substrate. The second semiconductor layer is provided near the first semiconductor layer and formed above the semiconductor substrate via one of an insulating film and a cavity. The first and second MOS transistors are respectively provided on the first and second semiconductor layers, and each has a gate electrode arranged parallel to a boundary between the first and second semiconductor layers.
Proceedings ArticleDOI
An 18.5ns 128MB SOI DRAM with a floating body cell
Takashi Ohsawa,Katsuyuki Fujita,Kosuke Hatsuda,Tomoki Higashi,Mutsuo Morikado,Yoshihiro Minami,Tomoaki Shino,Hiroomi Nakajima,K. Inoh,Takeshi Hamamoto,Shigeyoshi Watanabe +10 more
TL;DR: In this article, a dynamic latch sense amplifier/bit line replenishes "1" cells with holes lost during word line cycles and reduces the refresh busy rate, and a multi-averaging method of dummy cells over 128 pairs of "1s" and "0s" enhances the sense margin and contributes to the 18.5ns access time.