A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a compound represented by the formula (II), wherein R 1 represents a hydrogen atom or a methyl group; A 1 represents a C 1 to C 6 alkanediyl group; R 2 represents a C 1 to C 10 hydrocarbon group having a fluorine atom; ring W 1 represents a C 2 to C 36 substituted heterocyclic ring; R 3 represents a C 1 to C 30 hydrocarbon group, and one or more —CH 2 — contained in the hydrocarbon group may be replaced by —O— or —CO—.

Resist composition and method for producing resist pattern

A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group, or a C2 to C4 acyloxy group, and one or more —CH2— contained in the heterocyclic group may be replaced by —CO— or —O—.

Resin, resist composition and method for producing resist pattern

A salt represented by the formula (I-CC): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-CC) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

Salt and photoresist composition containing the same

PROBLEM TO BE SOLVED: To provide a resist composition capable of manufacturing a resist pattern less in defect with excellent CD uniformity.SOLUTION: There are provided a resin consisting only of a constitutional unit derived from a compound represented by the formula (I0) and a resist composition containing a resin having an acid unstable group and an acid generator. (IO), where Rrepresents an alkyl group having a halogen atom, a hydrogen atom or a halogen atom, Rrepresents a linear or branched aliphatic hydrocarbon group, Rfand Rfrepresent each a perfluoroalkyl group, Arepresents a single bond, an alkanediyl group having 1 to 6 carbon atoms or-A-X-(A-X)-(A)-, * represents a biding hand with an oxygen atom, A, Aand Arepresent each an alkanediyl group, Xand Xrepresent each -O-. -CO-O- or -O-CO- and a and b represent each 0 or 1.SELECTED DRAWING: None

Resist composition and manufacturing method of resist pattern

To provide a thiopyran derivative, having a structure expressed by the following general formula 1: where X is O or S; R1 is —H, —CH3, C2-4 alkyl group, thioether group, or ketone group; R2 is —H, —CH3, or trifluoromethyl group; and R1 and R2 may be identical to or different from each other.

Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition

PROBLEM TO BE SOLVED: To provide a polymer which is excellent in roughness reduction, solubility, compatibility, defect reduction, and exposure sensitivity or the like when used for a positive photoresist, and to provide a monomer for preparing the polymer.SOLUTION: A compound is represented by a formula (I) (wherein Ris a hydrogen atom, a halogen atom, a methyl group, or a trifluoromethyl group).

Homoadamantane derivative, process for preparing the same, and photoresist composition

PROBLEM TO BE SOLVED: To provide a polymer exhibiting excellent roughness reduction capability, solubility, compatibility, defect reduction capability, exposure sensitivity and the like when used as a positive photoresist, a monomer for producing the same, and a precursor (an intermediate, or a modifier) thereofSOLUTION: The homoadamantane derivative is represented by formula (I) (wherein R, Rare each hydrogen or a 1-6C straight chain, branched or cyclic hydrocarbon group; X is a hydroxy group or a halogen atom; and n and m are each an integer of 0 to 3, provided that n and m are not 0 at the same time)

Homoadamantane derivative, method of producing the same, and photosensitive material for use in photoresist

A compound represented by the following formula (I), wherein R 1 is a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group.

Homoadamantane derivatives, process for preparing same, and photoresist compositions

Disclosed is a homoadamantane derivative represented by formula (I). In the formula, R1 and R2 each represent a hydrogen atom or C&1-6& linear, branched or cyclic hydrocarbon group; X represents a hydroxyl group or halogen atom; and n and m are each an integer of 0 - 3. Here, n and m are not 0 at the same time.

Homoadamantane derivative, method for producing same, and photosensitive material for photoresist

PROBLEM TO BE SOLVED: To provide an adamantane derivative having excellent light resistance, heat resistance, mechanical properties, adhesiveness and etching resistance, a reaction product thereof, a resin composition containing them, a method for producing them and uses thereof. SOLUTION: The adamantane derivative has a structure having an acrylate structure and an adamantane skeleton bonded to a benzene ring. The adamantane derivative reaction product represented by formula is obtained by reacting the adamantane derivative with a polycarboxylic acid and/or a polycarboxylic acid anhydride. The resin composition comprises them. The methods for producing them are provided. Uses thereof are provided. COPYRIGHT: (C)2010,JPO&INPIT

Yoshitaka Uenoyama

Papers

Homoadamantane derivative, process for preparing the same, and photoresist composition

Homoadamantane derivative, method of producing the same, and photosensitive material for use in photoresist

Homoadamantane derivatives, process for preparing same, and photoresist compositions

Homoadamantane derivative, method for producing same, and photosensitive material for photoresist

Adamantane derivative, reaction product thereof, curable resin composition containing the same, method for producing them and use