Y
Yoshito Tanaka
Researcher at Daikin
Publications - 178
Citations - 1313
Yoshito Tanaka is an academic researcher from Daikin. The author has contributed to research in topics: Monomer & Polymer. The author has an hindex of 17, co-authored 175 publications receiving 1308 citations. Previous affiliations of Yoshito Tanaka include Panasonic & Minolta.
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Patent
Thin coating film comprising fluorine-containing polymer and method of forming same
TL;DR: In this article, the method of forming the thin coating film of fluorine-containing polymer having heat resistance and non-sticking property by adhering directly to a substrate without lowering characteristics such as reflection and light transmission which the substrate has is described.
Patent
Coating composition, coating film, and method for producing coating film
TL;DR: In this paper, the water-repellent coating film has excellent transparency, abrasion resistance, weather resistance and water repellency, the method for producing the coating film, the multi-functional composite material provided with the coating and the coating composition used therefor which has excellent dispersion stability.
Patent
Curable fluoropolymer, curable resin composition containing the same, and antireflection film
TL;DR: A curable fluoropolymer which is represented by the formula -(A)-(M)- {wherein (M) is represented as the formula (1) [wherein X?1 and X2? each is hydrogen or fluorine; X3 is hydrogen, fluorine, CH?3?, or CF3; and X?4 and X5? each are hydrogen, fluoroalkyl, or CF?3?], and (A) is a structural unit derived from a monomer copolymerizable with the ethylenic fluoromonomer
Patent
Fluorine-containing adhesive and adhesive film and laminated article made by using same
TL;DR: A fluorine-containing adhesive is a polymer having functional group which has a crystalline melting point or glass transition temperature of not more than 270° C and is prepared by copolymerizing (a) 0.05 to 30% by mole of at least one of fluorine containing ethylenic monomers having at least functional group selected from the group consisting of carboxyl and a carboxylic salt group and (b) 70 to 99.95% by Mole of at at least One of fluorinescontaining ethyleni monomers which do not have the above
Patent
Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
TL;DR: In this paper, a fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorinecontaining base polymer prepared from the polymer and a chemically amplifying type resist composition obtained therefrom.