An organic light emitting display apparatus that has high (or improved) contrast and/or impact resistance. The organic light emitting display apparatus includes: a substrate; an organic light emitting device on the substrate to display an image; a sealing member on the organic light emitting device; a semitransparent film on a surface of the sealing member facing away from the organic light emitting device to transmit a portion of external light and to reflect another portion of the external light; a passivation film on the semitransparent film to protect the semitransparent film; and a transmissive black layer between the sealing member and the organic light emitting device to increase contrast, wherein the semitransparent film has a refractive index greater than that of the passivation film.

Organic light emitting display apparatus

In an aspect, a system and method for assembling a semiconductor device on a receiving surface of a destination substrate is disclosed. In another aspect, a system and method for assembling a semiconductor device on a destination substrate with topographic features is disclosed. In another aspect, a gravity-assisted separation system and method for printing semiconductor device is disclosed. In another aspect, various features of a transfer device for printing semiconductor devices are disclosed.

Apparatus and methods for micro-transfer printing

An imaging apparatus includes an acquisition unit; a filter unit carrying out average differential filtering for image data acquired; a face area detection unit which detects the face area of the subject from image data subjected to average differential filter by the filter unit on the basis of the feature quantity stored; a focusing unit carrying out focusing control to be focused on the face area when the face area of the subject is detected; an image capturing unit capturing an image focused on the face area as a still image when the face area of the subject is detected; and a shutter speed control unit, when the face area of the subject is detected, increasing a shutter speed during the focusing control and during capturing the still image compared to a shutter speed when the face area of the subject is not detected.

Imaging apparatus and image capturing method

The invention relates to a moire detecting and suppression method and device. The method comprises the steps of (a) shooting a first image of an LED display screen through an image acquiring device, and analyzing the gray level distribution of the first image in a frequency domain; (b) determining a moire existential state of the first image according to the gray level distribution; (c) adjusting the parameters of the image acquiring device and/ or the LED display screen according to the moire existential state. According to the method, the image of the LED display screen is acquired and subjected to moire detection, and saturation analysis and imaging area analysis of the image are realized, so as to guide and adjust the parameters of the image acquiring device and the LED display screen to suppress moire generated by shooting of the image acquiring device, so that adverse influences of the moire on subsequent correction can be effectively prevented.

Moire detecting and suppression method and device

A display panel test apparatus includes: an image pickup part which picks up an image from a target display panel; a jig including a receiving part which receives the target display panel, a fixing part which fixes the image pickup part, and an adjusting part which adjusts an image pickup angle of the image pickup part; a pattern generating part which provides the target display panel with a test pattern; a defect extracting part which analyzes test image data provided from the image pickup part using a defect extracting algorithm and extracts display defect information, where the defect extracting algorithm includes different settings corresponding to different types of display defects; and a control part which generates evaluated data corresponding to a viewing angle of the target display panel using the image pickup angle of the image pickup part and the display defect information.

Display panel test apparatus and method of testing a display panel using the same

An unevenness inspection method for inspecting presence of unevenness in a panel material, the method includes: acquiring a plurality of primary images by imaging the panel material under inspection on a plurality of levels of condition; creating a plurality of secondary images by processing the plurality of primary images to enhance variation of the image; creating a composite image by combining the plurality of secondary images with a prescribed weighting; and determining the presence of unevenness using the composite image, the prescribed weighting being determined so that a region having the unevenness can be distinguished from the other region, when the plurality of secondary images are created for the panel material for training use having unevenness and are combined into a composite image.

Unevenness inspection method, method for manufacturing display panel, and unevenness inspection apparatus

According to one embodiment, a patterning method includes releasing the template from the cured imprint resist, aligning an alignment mark formed in the non-imprint portion of the template with the transfer pattern of the alignment pattern without causing the alignment mark to contact the imprint resist, and causing the main pattern and the alignment pattern of the template to contact an imprint resist that is supplied to a shot region adjacent to the cured imprint resist and uncured. The method includes curing the imprint resist of the adjacent shot region in the state of the template being in contact to form the transfer pattern of the main pattern and the transfer pattern of the alignment pattern in the imprint resist.

Patterning method and template

PROBLEM TO BE SOLVED: To provide a moire removing method, along with a manufacturing method of a display, to acquire an image of high resolution and reduced moire. SOLUTION: The signal of spatial axis representing the image where a moire occurs is converted into the signal of frequency axis (step S1). The signal of frequency axis is subtracted with a frequency component corresponding to the moire (step S2). The signal of frequency axis in which a frequency component corresponding to moire is removed is converted into the signal of spatial axis (step S3). Thus, the moire is removed from the image where the moire has occurred. COPYRIGHT: (C)2008,JPO&INPIT

Moire removing method and manufacturing method of display

An EUV exposure apparatus according to embodiments includes a reticle stage which suctions a rear surface side of an EUV mask to retain the EUV mask. In addition, the EUV exposure apparatus includes a detection unit which detects a position of a measurement mark formed on the rear surface of the EUV mask in the state where the EUV mask is suctioned on the reticle stage. In addition, the EUV exposure apparatus includes a control unit which calculates a distortion amount of the EUV mask based on the position of the measurement mark and performs exposure control on a wafer while correcting the distortion amount.

Euv exposure apparatus, euv mask, and method of measuring distortion

According to one embodiment, a method for measuring pattern misalignment, includes: a first step obtaining image data; a second step specifying a measurement region; a third step calculating a first shift amount (x 1 , y 1 ); a fourth step determining, after calculating the first shift amount, a first distribution; a fifth step executing a plurality of times the second step, the third step, and the fourth step; a seventh step calculating a second shift amount (x 2 , y 2 ); an eighth step determining, after calculating the second shift amount, a second distribution; a ninth step executing a plurality of times the sixth step, the seventh step, and the eighth step; and a tenth step calculating a difference (x 2 −x 1 , y 2 −y 1 ) between the second pattern misalignment and the first pattern misalignment.

Yosuke Okamoto

Papers

Unevenness inspection method, method for manufacturing display panel, and unevenness inspection apparatus

Patterning method and template

Moire removing method and manufacturing method of display

Euv exposure apparatus, euv mask, and method of measuring distortion

Method for measuring pattern misalignment