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Yung-Sheng Huang
Researcher at Harvard University
Publications - 7
Citations - 474
Yung-Sheng Huang is an academic researcher from Harvard University. The author has contributed to research in topics: Nanowire & Substrate (printing). The author has an hindex of 3, co-authored 7 publications receiving 474 citations.
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Patent
Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors, and fabricating such devices
TL;DR: A bulk-doped semiconductor is a semiconductor that is at least one of the following: a single crystal, an elongated and bulk-depletioned semiconductor with a largest cross-sectional dimension less than 500 nanometers as discussed by the authors.
Patent
Electrical device comprising doped semiconductor nanowires and method for its production
TL;DR: In this article, a method for depositing one or more semiconductor nanowires on a substrate, the method comprising providing a substrate and depositing the one or multiple semiconductors on the surface of the substrate is described.
Patent
Method for growing nanowires
TL;DR: In this article, a method for growing a population of semiconductor nanowires catalytically from the population of catalytic particles was proposed, where the diameter of the population was defined as the smallest width less than 500 nanometers.
Patent
Method for depositing a semiconductor nanowire
TL;DR: In this paper, a method for depositing one or more semiconductor nanowires on a substrate, the method comprising providing a substrate and depositing the one or multiple semiconductors on the surface of the substrate is described.