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Yung-Sheng Huang

Researcher at Harvard University

Publications -  7
Citations -  474

Yung-Sheng Huang is an academic researcher from Harvard University. The author has contributed to research in topics: Nanowire & Substrate (printing). The author has an hindex of 3, co-authored 7 publications receiving 474 citations.

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Patent

Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors, and fabricating such devices

TL;DR: A bulk-doped semiconductor is a semiconductor that is at least one of the following: a single crystal, an elongated and bulk-depletioned semiconductor with a largest cross-sectional dimension less than 500 nanometers as discussed by the authors.
Patent

Electrical device comprising doped semiconductor nanowires and method for its production

TL;DR: In this article, a method for depositing one or more semiconductor nanowires on a substrate, the method comprising providing a substrate and depositing the one or multiple semiconductors on the surface of the substrate is described.
Patent

Method for growing nanowires

TL;DR: In this article, a method for growing a population of semiconductor nanowires catalytically from the population of catalytic particles was proposed, where the diameter of the population was defined as the smallest width less than 500 nanometers.
Patent

Method for depositing a semiconductor nanowire

TL;DR: In this paper, a method for depositing one or more semiconductor nanowires on a substrate, the method comprising providing a substrate and depositing the one or multiple semiconductors on the surface of the substrate is described.