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Yunhui Shi
Researcher at Hebei University of Technology
Publications - 2
Citations - 54
Yunhui Shi is an academic researcher from Hebei University of Technology. The author has contributed to research in topics: Polishing & Chemical-mechanical planarization. The author has an hindex of 1, co-authored 2 publications receiving 9 citations.
Papers
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Journal ArticleDOI
Improvement in chemical mechanical polishing of 4H-SiC wafer by activating persulfate through the synergistic effect of UV and TiO2
Wantang Wang,Baoguo Zhang,Yunhui Shi,Tengda Ma,Jiakai Zhou,Ru Wang,Hanxiao Wang,Nengyuan Zeng +7 more
TL;DR: In this article, the effect of pH, persulfate concentration, and TiO2 dosage on CMP in-depth, and to ultimately optimize the polishing process was investigated for improving the CMP properties of Si-face of the 4H-SiC wafers.
Journal ArticleDOI
Improved chemical mechanical polishing performance in 4H-SiC substrate by combining novel mixed abrasive slurry and photocatalytic effect
TL;DR: In this paper, a mixed abrasive slurry (MAS) with photocatalytic effect in the SiC-CMP process is proposed to improve the performance of the slurry with or without the presence of UV irradiation.