Patent
Charged particle beam lithography apparatus and method
Reads0
Chats0
TLDR
In this article, a drawing apparatus for efficiently calculating pattern area density and proximity effect compensation is provided, which includes a block area dividing section 122 for dividing a lithography area into a plurality of first block areas in different sizes to provide the almost equal number of shots.Abstract:
PROBLEM TO BE SOLVED: To provide a drawing apparatus for efficiently calculating pattern area density and proximity effect compensation. SOLUTION: A lithography apparatus 100 includes a block area dividing section 122 for dividing a lithography area into a plurality of first block areas in different sizes to provide the almost equal number of shots, an area density calculating section 126 for calculating each internal pattern area density in each first block area, a second block area dividing section 128 to newly divide the lithography area into a plurality of second block areas, a proximity effect correction calculating section 134 to calculate amount of radiation of light for each internal proximity effect correction using pattern area density in each second block area, a radiation amount calculating section 134 to calculate amount of radiation beam using amount of radiation of light for proximity effect correction, and a lithography section 150 for implementing lithography in the calculated amount of radiation of beam. Thus, fluctuation in calculating time periods among blocks can be eliminated. COPYRIGHT: (C)2009,JPO&INPITread more
Citations
More filters
Patent
Charged particle beam writing apparatus and charged particle beam writing method
TL;DR: In this paper, a charged particle beam writing apparatus includes a shot division unit configured to divide a figure defined in layout data into a plurality of shot figures each having a size which can be irradiated by one shot of a charge particle beam.
Patent
Charged particle beam writing apparatus and charged particle beam writing method
TL;DR: A charged particle beam writing apparatus includes a unit calculating a total charge amount of charged particle beams irradiating each minimum deflection region in deflection regions having different deflection sizes respectively deflected by deflectors of a plurality of levels as mentioned in this paper.
Patent
Charged particle beam drawing apparatus, and charged particle beam drawing method
TL;DR: In this article, a charged particle beam drawing apparatus has been proposed to calculate shot density or drawing pattern area density in a short processing time, where the drawing data having a layout for a plurality of same chip regions to be disposed is input and stored, a drawing data pre-processing part which calculates shot density, and a drawing part for performing drawing by applying charge particle beams sequentially onto a sample using the shot data.
Patent
Charged particle beam lithography apparatus and charged particle beam lithography method
TL;DR: In this paper, a charged particle beam lithography apparatus includes a first block area divider configured to divide a pattern forming area into a plurality of first block areas in order to make a number of shots when forming a pattern substantially equal.
Patent
Charged particle beam drawing method and apparatus
TL;DR: In this article, a charged particle beam drawing apparatus is described, which includes a charging particle beam gun, a first forming aperture member having an opening, and a second forming aperture having a movable stage for supporting a workpiece.
References
More filters
Patent
Method and device for electron beam drawing
Takayuki Abe,Yoshiaki Hattori,Tomohiro Iijima,Masamitsu Ito,Takashi Kamikubo,Mitsuko Shimizu,Naoharu Shimomura,貴司 上久保,尚治 下村,正光 伊藤,芳明 服部,みつ子 清水,隆幸 阿部,智浩 飯島 +13 more
TL;DR: In this article, a pattern designed by a CAD system is inputted in a data conversion calculator where a drawing data is converted, and the converted drawing data are inputted into a control calculation part.
Patent
Pattern lithography apparatus and method and its program, photomask and its manufacturing method, and integrated semiconductor circuit and its manufacturing method
Jun Kotani,潤 小谷 +1 more
TL;DR: In this article, a circuit pattern lithography system which can reduce the computing time by alleviating the load on the electronic computer which computes for correcting the proximity effect and loading effect and can appropriately correct those effects by adjusting exposure when manufacturing photomask blanks.
Patent
Charged beam delineating method and delineating device
TL;DR: In this paper, the authors proposed a method to provide practical accuracy which is very near to a matrix method, at a computation speed of order at the same degree as a method of an approximate solution.
Patent
Device and method for creating drawing data
TL;DR: In this article, a device for creating drawing data capable of efficiently conducting a distributed processing in a drawing device is proposed, which includes: a storage device 224 for storing a plurality of layout data files created in every first region with a chip region divided by the predetermined size; a width calculating part 232 for calculating each region size of a pluralityof frame regions which divide the chip region when the data in the plurality of layouts data files are converted to the drawing data having format adjusted to the device so that each data amount included inside respectively becomes closer amount; and a computing machine 234 for
Patent
Processor for lsi pattern data
TL;DR: In this paper, a design pattern is segmented into maps of several multiple of the number of processors, and then the numbers obtained by adding each number of in-map patterns become almost the same.