Patent
Process for depositing electrically conductive indium oxide coatings on a substrate
TLDR
In this article, the indium chelate of 2,2,6,6-tetramethylheptane-3,5-dione is volatilized in a heated carrier gas stream and brought into contact with a preheated substrate to be coated in an atmosphere containing oxygen or water.Abstract:
The indium chelate of 2,2,6,6-tetramethylheptane-3,5-dione is volatilized in a heated carrier gas stream and brought into contact with a preheated substrate to be coated in an atmosphere containing oxygen or water. The process is particularly applicable to the deposition of indium oxide on glass vidicon faceplates.read more
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Patent
MOCVD of indium oxide and indium/tin oxide films on substrates
TL;DR: Disclosed is a metalorganic chemical vapor deposition (MOCVD) process of depositing an indium oxide or a indium/tin oxide film on a substrate using indium alkyl etherate and organotin compound precursors.