What is under potential deposition?
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Underpotential deposition is a method of depositing thin films with atomic-level control. It involves the use of a first element to mediate the growth of a second material. The process occurs between a potential positive to the bulk deposition potential for the mediating element and a potential slightly greater than the bulk deposition potential of the material to be deposited. By cycling the applied voltage between these potentials, repeated desorption/adsorption of the mediating element can be used to precisely control film growth on a layer-by-layer basis .
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Underpotential deposition is a process in which a first element is deposited on a surface at a potential lower than its bulk deposition potential, allowing for the subsequent growth of a second material through overpotential deposition. | |
10 Citations | The provided paper does not mention anything about under potential deposition. |
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