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What is under potential deposition? 


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Underpotential deposition is a method of depositing thin films with atomic-level control. It involves the use of a first element to mediate the growth of a second material. The process occurs between a potential positive to the bulk deposition potential for the mediating element and a potential slightly greater than the bulk deposition potential of the material to be deposited. By cycling the applied voltage between these potentials, repeated desorption/adsorption of the mediating element can be used to precisely control film growth on a layer-by-layer basis .

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The provided paper does not mention anything about "under potential deposition."
The provided paper does not mention anything about under potential deposition.
The provided paper does not mention anything about under potential deposition.
Underpotential deposition is a process in which a first element is deposited on a surface at a potential lower than its bulk deposition potential, allowing for the subsequent growth of a second material through overpotential deposition.
The provided paper does not mention anything about under potential deposition.

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