PURPOSE:To emphasize abnormal pattern and facilitate discovering of abnormal portion, by a method wherein a plurality of video monitors having different vertical vs horizontal image multiplying ratio regarding the same picture are installed. CONSTITUTION:A CRT12 working as a light source and an optical system 13 are disposed to one side of an object 11 such as a photomask. The CRT12 is scanned by X, Y scanning circuit 14. A photo-multiplexer 15 is disposed to other side of the object 11 and opposed to the CRT12. Output of the photo-multiplexer 15 is amplified by an amplifier 16, and a video signal generator 17 generates video signal from output signal of the amplifier 16 and signal of the scanning circuit 14, and transmits the video signal to video monitors 18-1, 18-2. Pattern of the object is displayed in the monitors 18-1, 18-2 so that multiplying ratio to the same picture is different invertical vs horizontal ratio, thereby abnormal portion of the pattern is emphasized.

Pattern inspection device

PURPOSE:To obtain a reticle free from defection by observing and inspecting a reticle before transfer exposure by superposing a desired pattern, formed on a reticle for semiconductor exposure, on another idential pattern free from defection. CONSTITUTION:A reticle to be used actually is set at the prescribed place of a reduction projection and exposure device for porjection. A nondefective mask or nondefective pattern drawn by a plotter, etc., is similarly set to the reduction projection exposure device for projection. While projected image 301 of the nondefective pattern and reticle (alpha) images 301 and 302 are superposed mutually, part 301 which is the overlap between the both and part 302 which is not the overlap are observed and dust is found by a difference in contrast; after the reticle is washed, observation is taken again to form the nondefective reticle.

Reduction* projection and exposure device

PURPOSE:To improve the manufacturing yield of an IC by discovering a defect on a photomask used for manufacturing the IC simply and correcting the defective part CONSTITUTION:The pattern information of a photomask 1 held on a movable stage in X-, Y- and Z-directions is read by a television camera 3 via a microscope 2 and is converted into a video signal (a) On the other hand, data of pattern design of an IC is converted to a video signal (b) via a pattern data generator 4 The generator 4 receives the video signals (a), (b) and a video indicator 5 indicates pattern videos A, B on the screen

Inspecting device for photomask

PURPOSE:To enable several persons to make a check of a drawing in the same area, by irradiating a part where a check of a drawing is required with light from ligthing devices symmetric on an optical axis, and by projecting on the screen of a monitor television an image, taken by a telecamera through an enlarging lens, through a signal processor. CONSTITUTION:Lighting devices 5 and 5' lighting uniformly a part 4 to be checked in an enlarged drawing 3 for a check in, for example, two directions symmetric on an optical axis 2 are fitted to brackets 6 of a telecamera 1. The irradiation angle theta of the lighting devices 5 and 5' to the optical axis 2 is selected freely. Between the telecamera 1 and the drawing check area 4, an enlarging lens system 7 having proper magnifications is provided, and the telecamera 1, lighting devices 5 and 5', and enlarging lens system 7 are movable vertically and horizontally by means of a stage provided for moving purpose. A received signal is inputted to a monitor television 9 through a signal processor 8.

Drawing check device

PURPOSE:To turn pattern information of original pictures to digital information and operate the same together with the information signals of data thereby making possible the cross-reference inspection of the original pictures and the data

Akitani Masahiro

Papers

Lsi mask inspection device