Wave front shaping, the ability to manipulate light fields both spatially and temporally, in complex media is an emerging field with many applications. This review summarizes how insights from mesoscopic scattering theory have direct relevance for optical wave control experiments and vice versa. The results are expected to have an impact on a number of fields ranging from biomedical imaging to nanophotonics, quantum information, and communication technology.

Light fields in complex media: Mesoscopic scattering meets wave control

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

A microscopy and/or lithography system uses a comparatively low-resolution image projection system, which has a very small numerical aperture but large image field, in conjunction with a microlens array comprising miniature lens elements, each of which has a large numerical aperture but very small field. The projection system contains a small aperture stop which is imaged by the microlenses onto an array of diffraction-limited microspots on the microscope sample or printing surface at the microlens focal point positions, and the surface is scanned to build up a complete raster image from the focal point array. The system design thus circumvents the tradeoff between image resolution and field size which is the source of much of the complexity and expense of conventional wide-field, high-NA microscopy and microlithography systems. The system makes possible flat field, distortion-free imaging, with accurate overlay, focus, and warp compensation, over very large image fields (larger than the practical limits of conventional imaging means). In one embodiment it would use a Digital Micromirror Device as the image source, potentially eliminating the need for photomasks in semiconductor manufacture.

Microlens scanner for microlithography and wide-field confocal microscopy

A display system for providing a two dimensional image includes an essentially one dimensional light valve array. The diffractive light valve array includes modulator elements which diffract or reflect light incident thereon to an extent determined by an image element to be represented. The display system is arranged such diffracted light from the light-valve array passes through a magnifying lens and is separated from the reflected light from the array. A magnified virtual image of the array formed by the diffracted light is viewed through the magnifying lens. A scanning arrangement between the viewer and the magnifying lens scans the image of the light-valve array across the field of view of the viewer sufficiently quickly that the viewer perceives the scanned image as a two-dimensional image. In another arrangement a printer is formed by scanning a real image of the diffractive light valve array over a printing or recording medium.

Display device incorporating one-dimensional grating light-valve array

The majority of microelectromechanical system (MEMS) devices must be combined with integrated circuits (ICs) for operation in larger electronic systems. While MEMS transducers sense or control phys ...

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Integrating MEMS and ICs

An illumination device for producing models used for manufacturing electronic elements, or for direct illumination of wafers or substrates during the photolithographic steps required for their production, or for direct illumination of structures including light-sensitive layers, comprises a pulsed laser light source and a pattern generator. The pattern generator includes an optical Schlieren system and an active, matrix-addressable surface light modulator. The Schlieren system comprises a Schlieren lens arranged on a side of the surface light modulator, a projection lens facing away from the surface light modulator, and a mirror device which is arranged between the lenses for directing light coming from the light source onto the reflective surface on the surface light modulator. The Schlieren lens is arranged from the surface light modulator at a short distance relative to the focal length of the lens. A filter device is arranged in the diffraction image plane of the virtual point light source between the Schlieren lens and the projection lens, the filter device having a structural design of such a nature that it will either filter out the diffracted light reflected by the addressed surface areas of the surface light modulator or that it will filter out the undiffracted light. During the displacement of a positioning table, the model, the disk, the substrate or structure are composed of a plurality of partial images by adequate addressing of the surface light modulator.

Illumination device using a pulsed laser source a Schlieren optical system and a matrix addressable surface light modulator for producing images with undifracted light

A light exposure device for directly exposing photosensitive layers has a light source (2) and a pattern generator (3). The pattern generator (3) has an optical schlieren system (14) and an active, matrix-addressable surface light modulator (13). The schlieren system (14) has a schlieren objective (15) and a projection objective (16), as well as a reflecting device (17) arranged between both objectives that directs the light from the light source (2) onto the surface (19) of the surface light modulator (13). A filtering device (17, 17b) filters out diffracted light and lets through non diffracted light from the surface light modulator (13) to the projection objective (16). The structure to be exposed is secured on a movable positioning table (7). The surface light modulator is (13) addressed so that its non-addressed surface areas (19a, 19b, ...) correspond to the projection areas of the structure to be exposed.

Light exposure device.

We report on two different technologies for deformable micromirror devices as phase-modulating light valves for high-resolution optical applications. Both technologies are compatible with a 30 V CMOS technology for active matrix addressing. We have developed and fabricated a 512 × 464 pixel light valve with CMOS addressing and viscoelastic layer deformable mirrors on top. The performance of the light valve has been demonstrated by an application for fast submicron laser direct writing. Furthermore, we report promising results on cantilever-type deformable mirrors to be integrated with the CMOS active matrix.

Deformable micromirror devices as phase-modulating high-resolution light valves

This paper presents a novel CMOS-compatible fabrication process and evaluations of a micro mirror array (MMA) made of mono-crystalline silicon (m-Si) for adaptive optic (AO) applications. The m-Si mirror layer is transfer bonded from a silicon-on-insulator (SOI) donor wafer with adhesive wafer bonding towards an intermediate patterned polymer spacer layer and clamped with metal plating. We present a CMOS compatible, bond alignment-free fabrication scheme offering the potential for high air gap distances between substrate and mirrors and we show first measurements of the fabricated mirrors.

Andreas Gehner

Papers

Illumination device using a pulsed laser source a Schlieren optical system and a matrix addressable surface light modulator for producing images with undifracted light

Light exposure device.

Deformable micromirror devices as phase-modulating high-resolution light valves

Deformable micromirror devices as phase-modulating high-resolution light valves

CMOS-Integrable Piston-Type Micro-Mirror Array for Adaptive Optics Made of Mono-Crystalline Silicon using 3-D Integration