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Anthony S. Kewitsch
Researcher at California Institute of Technology
Publications - 51
Citations - 1716
Anthony S. Kewitsch is an academic researcher from California Institute of Technology. The author has contributed to research in topics: Laser & Photorefractive effect. The author has an hindex of 24, co-authored 48 publications receiving 1679 citations.
Papers
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Journal ArticleDOI
Self-focusing and self-trapping of optical beams upon photopolymerization.
Anthony S. Kewitsch,Amnon Yariv +1 more
TL;DR: It is demonstrated theoretically and experimentally that optical beams are self-focused and self-trapped upon initiating photopolymerization and the resulting nonlinear wave equation is shown to be nonlocal in time and displays self-Trapped solutions only for sufficiently low average optical intensities.
Journal ArticleDOI
All-fiber zero-insertion-loss add-drop filter for wavelength-division multiplexing.
TL;DR: An all-fiber add-drop filter was developed and fabricated by recording a Bragg grating in the waist of an asymmetric mode converter-coupler formed by adiabatic tapering and fusing of two locally dissimilar, single-mode optical fibers.
Patent
Wavelength selective optical couplers
TL;DR: In this article, a wavelength selective optical fiber coupler having various applications in the field of optical communications is disclosed, which can be used to combine or multiplex a plurality of lasers operating at slightly different wavelengths into a single fiber.
Patent
System and method for fabricating components of precise optical path length
TL;DR: In this paper, the frequency periodicity measurements are derived from differential delays induced by in-process glass elements between beam components in a polarization interferometer unit and from progressive wavelength scanning across a wavelength band of interest.
Journal ArticleDOI
Nonlinear optical properties of photoresists for projection lithography
Anthony S. Kewitsch,Amnon Yariv +1 more
TL;DR: In this paper, the authors proposed using the self-focusing and self-trapping phenomenon in projection photolithography to enhance the resolution and depth of focus of the projected image.