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Antonius Johannus Van Der Net
Researcher at ASML Holding
Publications - 13
Citations - 61
Antonius Johannus Van Der Net is an academic researcher from ASML Holding. The author has contributed to research in topics: Flow coefficient & Two-phase flow. The author has an hindex of 5, co-authored 13 publications receiving 61 citations.
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Patent
Lithographic apparatus and contamination removal or prevention method
Anthonius Martinus Cornelis Petrus De Jong,Hans Jansen,Martinus Hendrikus Antonius Leenders,Antonius Johannus Van Der Net,Peter Franciscus Wanten,Jacques Cor Johan Van der Donck,Robert Douglas Watso,Teunis Cornelis Van Den Dool,Nadja Schuh,Jan Willem Cromwijk +9 more
TL;DR: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and a mixture of hydrogen peroxide and ozone, or any combination selected from (a)-(d).
Patent
Lithographic apparatus and device manufacturing method having liquid evaporation control
Theodorus Petrus Maria Cadee,Johannes Henricus Wilhelmus Jacobs,Nicolaas Ten Kate,Erik Roelof Loopstra,Aschwin Lodewijk Hendricus Johannes Vermeer,Jeroen Johannes Sophia Maria Mertens,Christianus Gerardus Maria de Mol,Marcel Johannus Elisabeth Hubertus Muitjens,Antonius Johannus Van Der Net,Joost Jeroen Ottens,Johannes Anna Quaedackers,Maria Elisabeth Reuhman-Huisken,Marco Koert Stavenga,Patricius Aloysius Jacobus Tinnemans,Martinus Cornelis Maria Verhagen,Jacobus Johannus Leonardus Hendricus Verspay,Frederik Eduard De Jong,Koen Goorman,Boris Menchtchikov,Herman Boom,Stoyan Nihtianov,Richard Moerman,Martin Frans Pierre Smeets,Bart Leonard Peter Schoondermark,Franciscus Johannes Joseph Janssen,Michel Riepen +25 more
TL;DR: In this paper, a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
Patent
Lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus
Jeroen Gerard Gosen,Antonius Johannus Van Der Net,Bart Dinand Paarhuis,Van Boxtel Frank Johannes Jacobus,Jinggao Li +4 more
TL;DR: In this article, a gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas in order to separate the component from a moving part of the apparatus, and the gas curtain may be used to separate moving parts of an apparatus from the contaminated gas.
Patent
Lithographic apparatus and a method of measuring flow rate in a two phase flow
Pieter Jacob Kramer,Antonius Johannus Van Der Net,Erik Henricus Egidius Catharina Eummelen,Anthonie Kuijper +3 more
TL;DR: In this paper, a flow separator is provided to separate the two phase flow into a gas flow and a liquid flow, and a flow meter measures the flow rate of fluid in the gas flow or the liquid flow.
Patent
Humidifying apparatus, lithographic apparatus and humidifying method
TL;DR: In this paper, a humidifying apparatus is described in which gas is provided to a first side of a membrane and liquid to a second side of the same membrane, and the membrane is non-porous to the liquid but porous to vapor of the liquid and is liquidphilic to said liquid.