An article having a nanostructured surface and a method of making the same are described. The article can include a substrate and a nanostructured layer bonded to the substrate. The nanostructured layer can include a plurality of spaced apart nanostructured features comprising a contiguous, protrusive material and the nanostructured features can be sufficiently small that the nanostructured layer is optically transparent. A surface of the nanostructured features can be coated with a continuous hydrophobic coating. The method can include providing a substrate; depositing a film on the substrate; decomposing the film to form a decomposed film; and etching the decomposed film to form the nanostructured layer.

Superhydrophobic transparent glass (STG) thin film articles

This disclosure relates to methods that include depositing a first component and a second component to form a film including a plurality of nanostructures, and coating the nanostructures with a hydrophobic layer to render the film superhydrophobic. The first component and the second component can be immiscible and phase-separated during the depositing step. The first component and the second component can be independently selected from the group consisting of a metal oxide, a metal nitride, a metal oxynitride, a metal, and combinations thereof. The films can have a thickness greater than or equal to 5 nm; an average surface roughness (Ra) of from 90 to 120 nm, as measured on a 5 μm×5 μm area; a surface area of at least 20 m 2 /g; a contact angle with a drop of water of at least 120 degrees; and can maintain the contact angle when exposed to harsh conditions.

Superhydrophobic films and methods for making superhydrophobic films

Described are chemical mechanical polishing compositions and methods of using the compositions for planarizing a surface of a substrate that contains tungsten, the compositions containing silica abrasive particles and cationic surfactant.

Tungsten-processing slurry with cationic surfactant

The present invention relates to a nanocomposite comprising primary nanoparticles having a particle size of less than 10 nm said primary nanoparticles forming agglomerates with a bimodal size distribution, dispersed in a polymer matrix, wherein the nanocomposite comprises 10-80 wt. % of the agglomerates having a particle size of less than 30 nm and less than 20 wt. % of the agglomerates having a particle size of at least 100 nm, preferably at least 400 nm, based on the total weight of the agglomerates. The surface of the nanoparticles can be modified with a surface modifier. The composition can advantageously be used as an organic layer between two inorganic layers in high-refractive barrier structures for electronic devices such as organic light-emitting diode (OLED).

Nanocomposite, method to produce the same, a barrier structure for an electronic device and an oled comprising the same

Transparent omniphobic thin film articles

The invention provides a coating comprising fumed silica particles, wherein the fumed silica particles comprise aggregates of primary particles, wherein (a) the primary particles have a bimodal or multimodal particle size distribution representing populations of particles having at least a smallest average primary particle size and a largest average primary particle size, and wherein primary particles having a smaller average primary particle size are attached to primary particles having a larger average primary particle size, or (b) the aggregates have a bi-modal or multi-modal aggregate size distribution, and a carrier. The invention additionally provides a method for preparing a coated article comprising the coating.

Coating comprising multipopulation fumed silica particles

CMP processes, tools and slurries utilize metal oxide-polymer composite particles that include metal oxide particles and a polymer core. The metal oxide particles are modified with a modifying agent and are partially or fully embedded within the polymer core. Using these processes, tools and slurries can enhance removal rates, reduce defectivity and increase cleanability with respect to comparable systems and substrates.

Metal oxide-polymer composite particles for chemical mechanical planarization

CMP processes, tools and slurries utilize composite particles that include core particles having organosilica particles disposed about the core particles. Using these processes, tools and slurries can enhance removal rates, reduce defectivity and increase cleanability with respect to comparable systems and substrates.

Chemical mechanical planarization slurry composition comprising composite particles, process for removing material using said composition, cmp polishing pad and process for preparing said composition

Selon l'invention, des processus, des outils et des suspensions epaisses de polissage mecano-chimique mettent en oeuvre des particules composites d'oxyde metallique-polymere comprenant des particules d'oxyde metallique et un noyau polymere. Les particules d'oxyde metallique sont modifiees au moyen d'un agent modificateur et sont partiellement ou totalement integrees dans le noyau polymere. La mise en oeuvre de ces processus, outils et suspensions epaisses permet d'ameliorer les taux d'enlevement, de reduire la defectuosite et d'ameliorer la nettoyabilite par rapport a des systemes et substrats comparables.

Brian G. Prevo

Papers

Coating comprising multipopulation fumed silica particles

Metal oxide-polymer composite particles for chemical mechanical planarization

Chemical mechanical planarization slurry composition comprising composite particles, process for removing material using said composition, cmp polishing pad and process for preparing said composition

Particules composites d'oxyde métallique-polymère pour polissage mécano-chimique