scispace - formally typeset
C

C. Y. Huang

Researcher at National Taiwan University

Publications -  21
Citations -  242

C. Y. Huang is an academic researcher from National Taiwan University. The author has contributed to research in topics: Magnetoresistance & Colossal magnetoresistance. The author has an hindex of 7, co-authored 20 publications receiving 238 citations.

Papers
More filters
Journal ArticleDOI

Origin of the R-ion effect on Tc in RBa2Cu3O7.

TL;DR: Based on the lattice strains and our {ital dT}{sub {ital c}}/{ital dP} data, Wang et al. as discussed by the authors calculated the strain-induced charge redistribution between the charge reservoir and the CuO{sub 2} plane.
Journal ArticleDOI

Synthesis of novel conducting elastomers as polyaniline-interpenetrated networks of fullerenol-polyurethanes

TL;DR: In this paper, a technique for fabrication of conductive elastomers was demonstrated involving in situ polymerization of aniline at the near surface region of the fullerenol crosslinked poly(urethane-ether) networks.
Journal ArticleDOI

Determination of Mn Valence from X-Ray Absorption Near Edge Structure and Study of Magnetic Behavior in Hole-Doped (Nd1−xCax)MnO3System☆

TL;DR: In this paper, the authors measured the magnetic properties across the series (Nd{sub 1-x}Ca{sub x})MnO{sub 3} and showed that the perovskite NdMnNO(sub 3) is an antiferromagnet with two Neel temperatures (T{sub N}) of 14 and 60 K respectively.
Journal ArticleDOI

Origin of superconductivity suppression in (Dy{sub 1{minus}x}Pr{sub x})Ba{sub 2}Cu{sub 3}O{sub 7} studied by soft-x-ray absorption spectroscopy

TL;DR: In this paper, the authors measured the X-ray-absorption near-edge structure (XANES) spectra for the series of (Dy{sub 1{minus}x}Pr{sub x})Ba{sub 2}Cu{sub 3}O{sub 7{minus delta}} compounds (x=0{endash}0.7) to investigate how the variation of hole states related to superconductivity.
Journal ArticleDOI

Effect of an Al2O3 transition layer on InGaN on ZnO substrates by organometallic vapor-phase epitaxy

TL;DR: In-situ annealing of the transition layer was first performed right before InGaN growth in the chamber and high-resolution X-ray diffraction (HRXRD) measurements revealed that the thin Al 2 O 3 layer was an effective transition layer for the GaN films grown epitaxially on ZnO substrates as mentioned in this paper.