C
C. Y. Huang
Researcher at National Taiwan University
Publications - 21
Citations - 242
C. Y. Huang is an academic researcher from National Taiwan University. The author has contributed to research in topics: Magnetoresistance & Colossal magnetoresistance. The author has an hindex of 7, co-authored 20 publications receiving 238 citations.
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Journal ArticleDOI
Origin of the R-ion effect on Tc in RBa2Cu3O7.
TL;DR: Based on the lattice strains and our {ital dT}{sub {ital c}}/{ital dP} data, Wang et al. as discussed by the authors calculated the strain-induced charge redistribution between the charge reservoir and the CuO{sub 2} plane.
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Synthesis of novel conducting elastomers as polyaniline-interpenetrated networks of fullerenol-polyurethanes
TL;DR: In this paper, a technique for fabrication of conductive elastomers was demonstrated involving in situ polymerization of aniline at the near surface region of the fullerenol crosslinked poly(urethane-ether) networks.
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Determination of Mn Valence from X-Ray Absorption Near Edge Structure and Study of Magnetic Behavior in Hole-Doped (Nd1−xCax)MnO3System☆
TL;DR: In this paper, the authors measured the magnetic properties across the series (Nd{sub 1-x}Ca{sub x})MnO{sub 3} and showed that the perovskite NdMnNO(sub 3) is an antiferromagnet with two Neel temperatures (T{sub N}) of 14 and 60 K respectively.
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Origin of superconductivity suppression in (Dy{sub 1{minus}x}Pr{sub x})Ba{sub 2}Cu{sub 3}O{sub 7} studied by soft-x-ray absorption spectroscopy
TL;DR: In this paper, the authors measured the X-ray-absorption near-edge structure (XANES) spectra for the series of (Dy{sub 1{minus}x}Pr{sub x})Ba{sub 2}Cu{sub 3}O{sub 7{minus delta}} compounds (x=0{endash}0.7) to investigate how the variation of hole states related to superconductivity.
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Effect of an Al2O3 transition layer on InGaN on ZnO substrates by organometallic vapor-phase epitaxy
Nola Li,Shen-Jie Wang,C. Y. Huang,Zhe Chuan Feng,Adriana Valencia,Jeff Nause,Christopher J. Summers,Ian T. Ferguson +7 more
TL;DR: In-situ annealing of the transition layer was first performed right before InGaN growth in the chamber and high-resolution X-ray diffraction (HRXRD) measurements revealed that the thin Al 2 O 3 layer was an effective transition layer for the GaN films grown epitaxially on ZnO substrates as mentioned in this paper.