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Christophe Zinck

Researcher at TriQuint Semiconductor

Publications -  10
Citations -  260

Christophe Zinck is an academic researcher from TriQuint Semiconductor. The author has contributed to research in topics: Thin film & Deep reactive-ion etching. The author has an hindex of 6, co-authored 10 publications receiving 245 citations. Previous affiliations of Christophe Zinck include Soitec.

Papers
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Journal ArticleDOI

Resonant micro-mirror excited by a thin-film piezoelectric actuator for fast optical beam scanning

TL;DR: In this paper, a silicon resonant torsional micro-mirror excited by piezoelectric bimorph actuators is presented, which achieves optical beam scanning with large angular deflection at high frequency.
Patent

Wafer Level Package and Manufacturing Method Using Photodefinable Polymer for Enclosing Acoustic Devices

TL;DR: In this article, a photo definable polymer is formed into a frame structure around a device located on a device wafer while maintaining the polymer in a partially cured state, and additional polymer material is used form a cap structure on a carrier wafer.
Journal ArticleDOI

Development and characterization of membranes actuated by a PZT thin film for MEMS applications

TL;DR: In this paper, the authors presented the fabrication and characterization of silicon membranes actuated by thin piezoelectric films, and the influence of the membrane length implementation has been carefully analyzed.
Journal ArticleDOI

Modified free vibrating beam method for characterization of effective e31 coefficient and leakage resistance of piezoelectric thin films

TL;DR: In this paper, a modified free vibrating beam method has been developed in order to characterize the effective e31 piezoelectric transversal coefficient and the leakage resistance of thin films deposited onto a silicon beam.
Proceedings ArticleDOI

Design, integration and characterization of PZT tunable FBAR

TL;DR: In this paper, the authors presented the elaboration and characterization of PZT film bulk acoustic resonators, which are elaborated by deep reactive ion etching of silicon Resonators present quite small electromechanical characteristics (k/sub 33/sup 2/ and Q) Ferroelectric properties of the thin film make possible the tuning of the frequency resonance butterfly dependencies were both observed for series and parallel resonances.