C
Christopher P. Ausschnitt
Researcher at IBM
Publications - 88
Citations - 2313
Christopher P. Ausschnitt is an academic researcher from IBM. The author has contributed to research in topics: Metrology & Lithography. The author has an hindex of 29, co-authored 87 publications receiving 2295 citations.
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Patent
Optical metrology tool and method of using same
TL;DR: In this paper, an aperture between the objective lens and the image plane is adjusted to set the effective numerical aperture of an optical metrology tool to determine bias or overlay error in a substrate formed by a lithographic process.
Patent
Method of measuring bias and edge overlay error for sub-0.5 micron ground rules
TL;DR: In this paper, a method of determining bias or overlay error in a substrate formed by a lithographic process using a pair of straight vernier arrays of parallel elements, a staggered verniers array of parallel element, and optionally at least one image shortening array on the substrate is presented.
Patent
Method for overlay control system
TL;DR: In this paper, a method for overlay metrology and control is proposed to control field term alignment error at all levels and level-to-level metrology to control the field term, grid term, and translation alignment errors at different levels.
Patent
Differential critical dimension and overlay metrology apparatus and measurement method
TL;DR: In this article, a method for measuring a dimension on a substrate is described, wherein a target pattern (455) is provided with a nominal characteristic dimension that repeats at a primary pitch of period P, and has a pre-determined variation orthogonal to the primary direction.
Patent
Edge overlay measurement target for sub-0.5 micron ground rules
TL;DR: In this paper, a target for determining bias or overlay error in a substrate formed by a lithographic process uses a pair of straight vernier arrays of parallel elements, a staggered verniers array of parallel element, and optionally at least one image shortening array on the substrate.