Chunghsin Lee

TL;DR: In this article, an electron beam generator particularly adapted for direct-write semiconductor lithography applications is described, which includes a photoemissive cathode, a modulable laser for illuminating the photo emissive, and light optics to create an optical pattern on the cathode.

TL;DR: In this article, the design and performance of a laser-excited cesium antimonide (Cs3Sb) photoemissive electron source operating in an electron-gun configuration is described.

TL;DR: In this article, an approach for generating high density pulses of electrons thermionically is described. But it is not shown how to generate a high current density pulse in a low pressure cesium vapor atmosphere.

TL;DR: An electron beam generator particularly suitable for direct-write semiconductor lithography applications comprises a photoemissive cathode (16), a continuous wave laser (10), a modulator (11) for varying the intensity of or deflecting the laser beam, and light optics (12) to create an optical pattern on the cathode.

TL;DR: In this article, test results from lowvoltage (2-20 kV) diodes containing cesiated tungsten cathodes are discussed. And the results show that these cathodes can achieve current densities of up to 30 A/cm2 in fields with maximum strengths of 40 kV/cm.