Craig A. Roderick

TL;DR: A domed plasma reactor chamber uses an antenna driven by RF energy (LF, MF, or VHF) which is inductively coupled inside the reactor dome for etching metals, dielectrics and semiconductor materials as discussed by the authors.

TL;DR: In this article, a plasma reactor having a chamber for containing a plasma and a passageway communicating with the chamber is enhanced with a first removable plasma confinement magnet module placed adjacent the passagway including a first module housing and a first plasma confinement inside the housing.

TL;DR: A polymer-hardening precursor or silicon piece may be an integral part of the reactor chamber walls and/or ceiling or a separate, expendable and quickly removable piece, and the heating/cooling apparatus may be of any suitable type including apparatus which conductively or remotely heats the silicon piece as mentioned in this paper.

TL;DR: In this paper, various magnetic and voltage processing enhancement techniques are disclosed, along with etch processes, deposition processes and combined etch/deposition processes, which allows processing of sensitive devices without damage and without microloading.

TL;DR: An electrostatic chuck for holding an article to be processed in a plasma reaction chamber and comprising a metal pedestal coated with a layer of dielectric material in which is formed a cooling gas distribution system for passing and distributing cooling gas between the upper surface of the layer and the article when supported on the pedestal.