scispace - formally typeset
D

Da In Sung

Researcher at Sungkyunkwan University

Publications -  4
Citations -  25

Da In Sung is an academic researcher from Sungkyunkwan University. The author has contributed to research in topics: Layer (electronics) & Etching (microfabrication). The author has an hindex of 2, co-authored 2 publications receiving 9 citations.

Papers
More filters
Journal ArticleDOI

Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide

TL;DR: In this article , the effects of chemical branch structure of three C3H2F6 isomers on the plasma characteristics and etch characteristics of high aspect ratio ACL patterned SiO2 were investigated.
Journal ArticleDOI

Fabrication of high-performance graphene nanoplatelet-based transparent electrodes via self-interlayer-exfoliation control

TL;DR: A novel means of fabricating uniform and thin GNP-based high-performance transparent electrodes for flexible and stretchable optoelectronic devices involving the use of an adhesive polymer layer (PMMA) as a GNP layer controller and by forming a hybrid GNP/AgNW electrode embedded on PET or PDMS is reported on.
Journal ArticleDOI

Investigation of SiO2 Etch Characteristics by C6F6/Ar/O2 Plasmas Generated Using Inductively Coupled Plasma and Capacitively Coupled Plasma

TL;DR: In this paper , the etch properties of C6F6/Ar/O2 in both an inductively coupled plasma (ICP) system and a capacitively coupled plasminar (CCP)-based system were evaluated to investigate the effects of high C/F ratio of perfluorocarbon (PFC) gas on SiO2 etch characteristics.
Journal ArticleDOI

Highly oxidation-resistant silver nanowires by C x F y polymers using plasma treatment.

TL;DR: It is believed that the fluorocarbon plasma treatment can be used as a key method for ensuring long-term oxidation stability in numerous electronic applications including flexible solar cells utilizing various types of metallic nanowires.