D
Da In Sung
Researcher at Sungkyunkwan University
Publications - 4
Citations - 25
Da In Sung is an academic researcher from Sungkyunkwan University. The author has contributed to research in topics: Layer (electronics) & Etching (microfabrication). The author has an hindex of 2, co-authored 2 publications receiving 9 citations.
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Journal ArticleDOI
Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide
Hyun-Woo Tak,Hye Joo Lee,Long Wen,Byung Jin Kang,Da In Sung,J. W. Bae,Dong Won Kim,Wonseok Lee,Seung Bae Lee,Keun-Youl Kim,Byeong-Ok Cho,Young Lae Kim,Hanbin Song,Geun Young Yeom +13 more
TL;DR: In this article , the effects of chemical branch structure of three C3H2F6 isomers on the plasma characteristics and etch characteristics of high aspect ratio ACL patterned SiO2 were investigated.
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Fabrication of high-performance graphene nanoplatelet-based transparent electrodes via self-interlayer-exfoliation control
TL;DR: A novel means of fabricating uniform and thin GNP-based high-performance transparent electrodes for flexible and stretchable optoelectronic devices involving the use of an adhesive polymer layer (PMMA) as a GNP layer controller and by forming a hybrid GNP/AgNW electrode embedded on PET or PDMS is reported on.
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Investigation of SiO2 Etch Characteristics by C6F6/Ar/O2 Plasmas Generated Using Inductively Coupled Plasma and Capacitively Coupled Plasma
TL;DR: In this paper , the etch properties of C6F6/Ar/O2 in both an inductively coupled plasma (ICP) system and a capacitively coupled plasminar (CCP)-based system were evaluated to investigate the effects of high C/F ratio of perfluorocarbon (PFC) gas on SiO2 etch characteristics.
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Highly oxidation-resistant silver nanowires by C x F y polymers using plasma treatment.
TL;DR: It is believed that the fluorocarbon plasma treatment can be used as a key method for ensuring long-term oxidation stability in numerous electronic applications including flexible solar cells utilizing various types of metallic nanowires.