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Daniel J. Rader
Researcher at Sandia National Laboratories
Publications - 60
Citations - 1369
Daniel J. Rader is an academic researcher from Sandia National Laboratories. The author has contributed to research in topics: Particle & Heat flux. The author has an hindex of 20, co-authored 60 publications receiving 1284 citations.
Papers
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Journal ArticleDOI
Momentum slip correction factor for small particles in nine common gases
TL;DR: Ishida et al. as mentioned in this paper reviewed and re-evaluated the slip correction data for a variety of common gases, including air, argon, helium, hydrogen, methane, ethane, isobutane, nitrous oxide and carbon dioxide.
Proceedings ArticleDOI
Direct simulation Monte Carlo: The quest for speed
Michail A. Gallis,John Robert Torczynski,Steven J. Plimpton,Daniel J. Rader,Timothy P. Koehler +4 more
TL;DR: In the 50 years since its invention, the acceptance and applicability of the DSMC method have increased significantly, whereas the increase in computer speed has been the main factor behind its greater applicability.
Journal ArticleDOI
Accuracy and efficiency of the sophisticated direct simulation Monte Carlo algorithm for simulating noncontinuum gas flows
TL;DR: In this article, the accuracy of a recently proposed direct simulation Monte Carlo (DSMC) algorithm, termed "sophisticated DSMC", is investigated by comparing simulation results to analytical solutions of the Boltzmann equation for one-dimensional Fourier Couette flow.
Journal ArticleDOI
Convergence behavior of a new DSMC algorithm
TL;DR: The new algorithm is shown to significantly reduce the computational resources required for a DSMC simulation to achieve a particular level of accuracy, thus improving the efficiency of the method by a factor of 2.5.
Patent
Apparatus to collect, classify, concentrate, and characterize gas-borne particles
TL;DR: An aerosol lab-on-a-chip (ALOC) as discussed by the authors integrates one or more of a variety of aerosol collection, classification, concentration (enrichment), and characterization processes onto a single substrate or layered stack of such substrates.