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Daniele Iencinella

Researcher at University of Bologna

Publications -  14
Citations -  219

Daniele Iencinella is an academic researcher from University of Bologna. The author has contributed to research in topics: Plasma-enhanced chemical vapor deposition & Silicon. The author has an hindex of 7, co-authored 14 publications receiving 210 citations.

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An optimized texturing process for silicon solar cell substrates using TMAH

TL;DR: In this article, the tetramethyl ammonium hydroxide (TMAH), (CH3)4NOH, solution for silicon random texturing was used for Heterojunction solar cells.
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Wide band-gap silicon-carbon alloys deposited by very high frequency plasma enhanced chemical vapor deposition

TL;DR: In this paper, the use of very high frequency (VHF) plasma enhanced chemical vapor deposition in a capacitive discharge is investigated to fabricate hydrogenated amorphous silicon carbon alloys, using silane and methane as silicon and carbon precursors, respectively, and hydrogen dilution of the gas mixture.
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Influence of the sputtering system's vacuum level on the properties of indium tin oxide films

TL;DR: In this article, the influence of the chamber residual pressure level in the radio frequency magnetron sputtering process on the electrical, optical and structural properties of indium thin oxide (ITO) is investigated.
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Thin-film solar cells on commercial ceramic tiles

TL;DR: In this article, a new contact arrangement was designed to minimize the shunting effect of short-circuit paths in porcelain stoneware tiles as thin-film solar cell substrates and an initial efficiency of 2.5% has been obtained using the new device structure for 7 cm 2 devices.
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Silicon heterojunction solar cells with p nanocrystalline thin emitter on monocrystalline substrate

TL;DR: In this paper, high-resolution transmission electron microscopy was used to obtain microscopic evidence of the long-range effects of hydrogen, already inferred by large area optical techniques, and it was observed that silicon nanocrystallites formed within the amorphous layer.