D
Danilo Vrtačnik
Researcher at University of Ljubljana
Publications - 62
Citations - 669
Danilo Vrtačnik is an academic researcher from University of Ljubljana. The author has contributed to research in topics: Thin film & Silicon. The author has an hindex of 13, co-authored 61 publications receiving 552 citations.
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The role of Triton surfactant in anisotropic etching of {1 1 0} reflective planes on (1 0 0) silicon
TL;DR: In this paper, Triton-x-100 surfactant was used as an additive to 25% TMAH in anisotropic etching of {1 1 0} silicon passive mirror planes.
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Microfluidic Technology for Clinical Applications of Exosomes.
TL;DR: General aspects of exosomes are introduced, the challenges in exosome research are presented, the potential ofExosomes as biomarkers are discussed, and the contribution of microfluidic technology to enable their isolation and analysis for diagnostic and disease monitoring is described.
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Experimental study of heat-treated thin film Ti/Pt heater and temperature sensor properties on a Si microfluidic platform
TL;DR: In this article, the design, fabrication and characterization of thin film Ti/Pt heaters and integrated temperature sensors on a Si microfluidic platform are presented, which provide controlled heating of microchannels realized on the opposite side of the Si platform.
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In Vivo Experimental Study of Noninvasive Insulin Microinjection through Hollow Si Microneedle Array
Drago Resnik,Matej Možek,Borut Pečar,Andrej Janež,V. Urbancic,Ciprian Iliescu,Danilo Vrtačnik +6 more
TL;DR: The transfer efficiency of in vivo insulin delivery through microinjection by using hollow silicon microneedle array was found to be predominantly limited by the inability of viable epidermis to absorb and allow higher drug transport toward the capillary-rich region.
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Morphological study of {311} crystal planes anisotropically etched in (100) silicon: role of etchants and etching parameters
TL;DR: In this paper, the formation of {311} planes by wet anisotropic etching of (100) silicon and the characterization by means of surface roughness, etch rates and related convex and concave corner dynamic behaviour during maskless etching were investigated.