D
David T. Read
Researcher at National Institute of Standards and Technology
Publications - 104
Citations - 1507
David T. Read is an academic researcher from National Institute of Standards and Technology. The author has contributed to research in topics: Ultimate tensile strength & Electron backscatter diffraction. The author has an hindex of 21, co-authored 103 publications receiving 1430 citations.
Papers
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A new method for measuring the strength and ductility of thin films
David T. Read,James W. Dally +1 more
TL;DR: In this paper, a method of measuring the mechanical strength of thin films is described, where miniature arrays of four tensile specimens, each 0.25 mm wide, 1 mm long, and 2.2 μm thick, are prepared using deposition, patterning, and etching processes common to the semiconductor industry.
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Tensile properties of free-standing aluminum thin films☆
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Morphology, microstructure, and mechanical properties of a copper electrodeposit
TL;DR: In this article, a 2.6 µm thick copper electrodeposit was made on silicon using laboratory procedures and similar to materials now widely used in advanced electronic interconnect structures.
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Tensile and fracture behavior of free-standing copper films
TL;DR: In this article, the deformation and crack growth behavior of free-standing, electron beam evaporated copper films suspended over windows etched in a silicon substrate were studied using a transmission electron microscope.
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Electron beam moiré
James W. Dally,David T. Read +1 more
TL;DR: In this paper, a line and dot pattern is produced by etching the sensitized resist. Butler et al. used a very small diameter, 10 to 20 nm, beam of electrons to sensitize a 100-nm thick layer of electron resist.