Coated article and method for producing the coated article. The article (1) is coated with a system which provides protection against oxidation and corrosion and which significantly reduces the substrate temperature. An MCrAlY layer (2) is applied to the article (1) to be protected and a columnar grain ceramic (4) is applied by vapor deposition to the MCrAlY coated article. An alumina layer (3) which exists between the MCrAlY layer (2) and the columnar ceramic layer (4) provides for the adherence of the columnar layer to the MCrAlY layer.

Columnar grain ceramic thermal barrier coatings

Coated article and method for producing the coated article. The article (1) is coated with a system which provides protection against oxidation and corrosion and which significantly reduces the substrate temperature. An MCrAlY layer (2) is applied to the article to be protected and a columnar grain ceramic (5) is applied by vapor deposition to the MCrAlY coated article. An alumina layer (4) which exists between the MCrAlY layer (2) and the columnar ceramic layer (5) provides for the adherence of the columnar layer to the MCrAlY layer. An important feature of the invention is that the interface (3) between the MCrAlY layer and the alumina layer has a low surface roughness and this greatly improves the columnar ceramic layer adherence.

Columnar grain ceramic thermal barrier coatings on polished substrates

A process and apparatus for the plasma deposition of a carbon-rich coating onto a substrate is provided. This method includes the steps of: providing a substrate in a vacuum chamber; and generating a carbon-rich plasma in the vacuum chamber by injecting a plasma gas into a hollow cathode slot system containing a cathode made of two electrode plates arranged parallel to each other, providing a sufficient voltage to create and maintain a carbon-rich plasma in the hollow cathode slot system, and maintaining a vacuum in the vacuum chamber sufficient for maintaining the plasma. The plasma is deposited on the substrate to form a carbon-rich coating.

Jet plasma process and apparatus

A polypropylene resin composition comprising an isotactic polypropylene component, a rubber component, and an inorganic filler component, wherein (a) the melt flow rate, according to ASTM D1238, is 20 g/10 min or more, (b) the flexural modulus, according to ASTM D790, is 2300 MPa or more, (c) the Izod impact strength, according to ASTM D256, is 180 J/m or more at 23°C and 45 J/m or more at -30°C, (d) the heat deformation temperature, according to ASTM D648, is 130°C or more, and (e) there is a diffraction peak unique to polypropylene of space group P21/c in the diffraction pattern measured by the wide angle X-ray diffraction method in an injection molded article of the composition formed under a quenching condition.

Polypropylene resin composition

Methods for improving microstructures of line-of-sight deposited films are described. Columnar growth defects ordinarily produced by geometrical shadowing during deposition of such films are eliminated without resorting to post-deposition thermal or mechanical treatments. The native, as-deposited coating qualities, including homogeneity, fine grain size, and high coating-to-substrate adherence, can thus be retained. The preferred method includes the steps of emitting material from a source toward a substrate to deposit a coating non-uniformly on the substrate surface, removing a portion of the coating uniformly over the surface, again depositing material onto the surface, but from a different direction, and repeating the foregoing steps. The quality of line-of-sight deposited films such as those produced by sputtering, progressively deteriorates as the angle of incidence between the flux and the surface becomes increasingly acute. Depositing non-uniformly, so that the coating becomes progressively thinner as quality deteriorates, followed by uniformly removing some of the coating, such as by resputtering, eliminates the poor quality portions, leaving only high quality portions of the coating. Subsequently sputtering from a different direction applies a high quality coating to other regions of the surface. Such steps can be performed either simultaneously or sequentially to apply coatings of a uniformly high quality, closed microstructure to three-dimensional or larger planar surfaces.

Methods for making deposited films with improved microstructures

An improved method is disclosed for coating substrates, such as turbine engine parts, at high rates by a physical vapor deposition process. The substrate to be coated and a vapor source, such as a metal alloy, heated by an electron beam, are placed in a chamber in which a gas pressure of greater than about 5 mT is maintained. When the source material is evaporated at a very high rate, such as greater than about 0.1 g/s or 13 g/s.m.sup. 2, the vapor is collimated and the collimation increases as the gas pressure or the evaporation rate increases. Collimation of the vapor allows a much higher deposition rate for a given evaporation power. Further, a much higher fraction of the evaporated material is deposited on the substrate. Despite the collimation, evaporated material deposits on areas of the substrate which are not in line-of-sight of the vapor source. If desired a substrate bias can be applied to bombard the substrate with ions before and during coating.

E. Darrell Erikson

Papers

Vapor collimation in vacuum deposition of coatings