Coated article and method for producing the coated article. The article (1) is coated with a system which provides protection against oxidation and corrosion and which significantly reduces the substrate temperature. An MCrAlY layer (2) is applied to the article (1) to be protected and a columnar grain ceramic (4) is applied by vapor deposition to the MCrAlY coated article. An alumina layer (3) which exists between the MCrAlY layer (2) and the columnar ceramic layer (4) provides for the adherence of the columnar layer to the MCrAlY layer.

Columnar grain ceramic thermal barrier coatings

Coated article and method for producing the coated article. The article (1) is coated with a system which provides protection against oxidation and corrosion and which significantly reduces the substrate temperature. An MCrAlY layer (2) is applied to the article to be protected and a columnar grain ceramic (5) is applied by vapor deposition to the MCrAlY coated article. An alumina layer (4) which exists between the MCrAlY layer (2) and the columnar ceramic layer (5) provides for the adherence of the columnar layer to the MCrAlY layer. An important feature of the invention is that the interface (3) between the MCrAlY layer and the alumina layer has a low surface roughness and this greatly improves the columnar ceramic layer adherence.

Columnar grain ceramic thermal barrier coatings on polished substrates

The present invention provides a plasma enhancement method and apparatus for electric arc vapor deposition. The plasma enhancement apparatus is positioned to act upon plasma generated from a plasma source before the plasma reaches a substrate to be coated by the plasma. The plasma enhancement apparatus includes a magnet disposed about a magnet axis and defining a first aperture, and a core member disposed about a core member axis and at least partially nested within the first aperture. The core member defines a second aperture, and the plasma enhancement apparatus is arranged and configured in such a manner that the evaporated cathode source material passes from the cathode source and through the second aperture toward the substrate to be coated by the evaporated cathode source material. The plasma is favorably conditioned as it passes through the plasma enhancement apparatus.

Plasma enhancement apparatus and method for physical vapor deposition

A process and apparatus for the plasma deposition of a carbon-rich coating onto a substrate is provided. This method includes the steps of: providing a substrate in a vacuum chamber; and generating a carbon-rich plasma in the vacuum chamber by injecting a plasma gas into a hollow cathode slot system containing a cathode made of two electrode plates arranged parallel to each other, providing a sufficient voltage to create and maintain a carbon-rich plasma in the hollow cathode slot system, and maintaining a vacuum in the vacuum chamber sufficient for maintaining the plasma. The plasma is deposited on the substrate to form a carbon-rich coating.

Jet plasma process and apparatus

A polypropylene resin composition comprising an isotactic polypropylene component, a rubber component, and an inorganic filler component, wherein (a) the melt flow rate, according to ASTM D1238, is 20 g/10 min or more, (b) the flexural modulus, according to ASTM D790, is 2300 MPa or more, (c) the Izod impact strength, according to ASTM D256, is 180 J/m or more at 23°C and 45 J/m or more at -30°C, (d) the heat deformation temperature, according to ASTM D648, is 130°C or more, and (e) there is a diffraction peak unique to polypropylene of space group P21/c in the diffraction pattern measured by the wide angle X-ray diffraction method in an injection molded article of the composition formed under a quenching condition.

Polypropylene resin composition

A method for coating a substrate with titanium nitride or titanium carbide or zirconium nitride or zirconium carbide is described wherein physical vapor deposition in a vacuum is used, and wherein the substrate is biased by an electrical potential and the composition of the deposit is changed by introducing a gas during the deposition to produce a hardness gradient in the deposit which increases outwardly from the substrate.

Method for coating a substrate to provide a titanium or zirconium nitride or carbide deposit having a hardness gradient which increases outwardly from the substrate

An improved method is disclosed for coating substrates, such as turbine engine parts, at high rates by a physical vapor deposition process. The substrate to be coated and a vapor source, such as a metal alloy, heated by an electron beam, are placed in a chamber in which a gas pressure of greater than about 5 mT is maintained. When the source material is evaporated at a very high rate, such as greater than about 0.1 g/s or 13 g/s.m.sup. 2, the vapor is collimated and the collimation increases as the gas pressure or the evaporation rate increases. Collimation of the vapor allows a much higher deposition rate for a given evaporation power. Further, a much higher fraction of the evaporated material is deposited on the substrate. Despite the collimation, evaporated material deposits on areas of the substrate which are not in line-of-sight of the vapor source. If desired a substrate bias can be applied to bombard the substrate with ions before and during coating.

Glen R Scheuermann

Papers

Method for coating a substrate to provide a titanium or zirconium nitride or carbide deposit having a hardness gradient which increases outwardly from the substrate

Vapor collimation in vacuum deposition of coatings

Verfahren zum beschichten eines substrates