E
E. I. Rogacheva
Researcher at National Technical University
Publications - 45
Citations - 340
E. I. Rogacheva is an academic researcher from National Technical University. The author has contributed to research in topics: Seebeck coefficient & Hall effect. The author has an hindex of 9, co-authored 45 publications receiving 291 citations.
Papers
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Journal ArticleDOI
Quantum size effects in n-PbTe∕p-SnTe∕n-PbTe heterostructures
E. I. Rogacheva,O. N. Nashchekina,A. V. Meriuts,S.G. Lyubchenko,M. S. Dresselhaus,G. Dresselhaus +5 more
TL;DR: In this article, the dependence of the thermoelectric properties of n-PbTe, p-SnTe, and n-pbTe heterostructures on the SnTe quantum well width (dSnTe=0.5-6.0nm) at fixed PbTe barrier layers thicknesses were studied.
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Semimetal–semiconductor transition in thin Bi films
TL;DR: In this paper, it was shown that the gap between the valence and conduction bands in the semiconductor region increases with decreasing temperature, and it was suggested that in this thickness range a semimetal-semiconductor transition occurs.
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The problem of doping of non-stoichiometric phases
TL;DR: In this article, an overview and analysis of the crystal structure, mechanical, thermal, galvanomagnetic and electrical properties of the non-stoichiometric semiconducting IV-VI phases under doping are presented.
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Thickness dependent quantum oscillations of transport properties in topological insulator Bi2Te3 thin films
TL;DR: In this article, the dependence of the electrical conductivity, the Hall coefficient, and the Seebeck coefficient on the layer thickness of p-type topological insulator Bi2Te3 thin films grown by thermal evaporation in vacuum on glass substrates were obtained at room temperature.
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Growth and structure of thermally evaporated Bi2Te3 thin films
E. I. Rogacheva,A. V. Budnik,M. V. Dobrotvorskaya,A.G. Fedorov,S. I. Krivonogov,Pavel V. Mateychenko,O. N. Nashchekina,A. Yu. Sipatov +7 more
TL;DR: In this paper, the growth mechanism, microstructure, and crystal structure of the polycrystalline n-Bi2Te3 thin films with thickness d = 15-350nm, prepared by thermal evaporation in vacuum onto glass substrates, were studied.