E
Eiichi Ando
Researcher at Asahi Glass Co.
Publications - 14
Citations - 443
Eiichi Ando is an academic researcher from Asahi Glass Co.. The author has contributed to research in topics: Sputtering & Layer (electronics). The author has an hindex of 9, co-authored 14 publications receiving 434 citations.
Papers
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Patent
Amorphous oxide film and article having such film thereon
TL;DR: An amorphous oxide film composed essentially of an oxide containing at least one member selected from the group consisting of Zr, Ti, Hf, Sn, Ta and In as mentioned in this paper.
Patent
Laminated glass structure
TL;DR: In this article, a laminated glass structure is provided containing at least one glass sheet, a plastic layer provided at the bonding surface of the glass sheet and a functioning layer having single-or multi-layered films between the bonding surfaces of the sheet and the plastic layer.
Patent
Methods for producing functional films
TL;DR: In this paper, a method for producing a transparent conductive film composed mainly of an oxide by sputtering using a sputtering target capable of forming a transparentconductive film, wherein intermittent electric power is supplied to the target.
Journal ArticleDOI
Solar control coating on glass
Junichi Ebisawa,Eiichi Ando +1 more
TL;DR: Recently major progress has been made in the sputtering process by several manufacturers, which has enabled both a stable and high rate of deposition as discussed by the authors, which is becoming increasingly important because of its excellent and versatile performance.
Patent
Method for forming low refractive index film comprising silicon dioxide
TL;DR: In this paper, the main component of a film comprising silicon dioxide was described and a method for forming it by reactive DC sputtering was proposed. But this method was not suitable for the case of multi-layered films.