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Eui-Jung Yun

Researcher at Hoseo University

Publications -  63
Citations -  328

Eui-Jung Yun is an academic researcher from Hoseo University. The author has contributed to research in topics: Thin film & X-ray photoelectron spectroscopy. The author has an hindex of 9, co-authored 60 publications receiving 291 citations.

Papers
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Effect of high-energy electron beam irradiation on the properties of ZnO thin films prepared by magnetron sputtering

TL;DR: In this paper, high energy electron beam irradiation (HEEBI) performed in air at room temperature affects remarkably the electrical, optical, and structural properties of undoped ZnO films prepared on SiO2 substrates by magnetron sputtering techniques.
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Microfabrication and characteristics of low-power high-performance magnetic thin-film transformers

TL;DR: In this paper, the authors investigated low power (1.5-W), solenoid-type magnetic thin-film transformers with a Ni/sub 81/Fe/sub 19/ core for a 5-MHz drive dc-dc converter application.
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Characterization of Al–As codoped p-type ZnO films by magnetron cosputtering deposition

TL;DR: The p-type conductivity of the films was revealed by Hall measurements, x-ray photoelectron spectroscopy (XPS), and photoluminescence measurements after being annealed in O2 as mentioned in this paper.
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Microfabrication and characteristics of double-rectangular spiral type thin-film inductors with an upper NiFe magnetic core

TL;DR: In this article, double-rectangular spiral-type thin-film inductors with an upper Ni81Fe19 core for 5 MHz drive dc-dc converter application were investigated, and the results comparable to those reported in recent literature for similar inductors sandwiched by more complex magnetic core materials.
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Effect of high-energy electron beam irradiation on the properties of AZO thin films prepared by rf magnetron sputtering

TL;DR: In this article, high-energy electron beam irradiation (HEEBI) performed in air at room temperature affected remarkably the properties of Al-doped ZnO (AZO) films grown on SiO 2 substrates by radio frequency magnetron sputtering techniques.