This review highlights the synthesis, processing and properties of non-oxide silicon-based ceramic materials derived from silazanes and polysilazanes. A comprehensive summary of the preparation of precursor compounds containing Si–N–Si units, including commercially available materials, is followed by the discussion of various processing techniques. The fabrication of dense bulk ceramics in the Si/E/C/N systems is reported which involves cross-linking of the polymeric ceramic precursor followed by a polymer-to-ceramic transformation step. The cross-linked precursor can be milled, compacted and pyrolysed to form dense, additive-free, amorphous silicon carbonitride monoliths or polycrystalline composites which withstand oxidation in air at 1600°C. Furthermore, an overview is given on the fabrication of silazane derived powders and coatings involving chemical vapour deposition (CVD) methods utilising volatile precursors. Fibre spinning and fibre properties, as well as other processing techniques like infiltration of preforms, the preparation of porous ceramics and joining are briefly discussed. A state of the art of the mechanical properties of polymer derived amorphous Si/C/N and Si/B/C/N ceramics with respect to hardness as well as high-temperature creep and oxidation resistance is summarised. Finally, some important aspects of industrial applications will be considered. The review is in part based on our own work related to the polysilazane derived ceramics, but will also cover a comprehensive state of the art including the published literature in this field.

Silazane derived ceramics and related materials

Mechanical and optical properties of hard SiCN coatings prepared by PECVD

Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N2 and Ar

https://ir.nctu.edu.tw:443/bitstream/11536/30993/1/000084500800019.pdf

Crystalline SiCN: a hard material rivals to cubic BN

XPS studies of amorphous SiCN thin films prepared by nitrogen ion-assisted pulsed-laser deposition of SiC target

Silicon–carbon–nitrogen alloys have been deposited by electron cyclotron resonance plasma chemical vapor deposition. Nitrogen, methane, and argon diluted silane have been used as precursor gases. The properties of the deposited films were studied by spectroscopic ellipsometry, Fourier transform infrared spectroscopy, X‐ray photoelectron, and Auger electron spectroscopy. The structure and bond formation in the SiCN films is discussed in terms of the present results.

F. J. Gómez

Papers

SiCN alloys deposited by electron cyclotron resonance plasma chemical vapor deposition