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F.O. Adurodija

Researcher at Mount Allison University

Publications -  30
Citations -  881

F.O. Adurodija is an academic researcher from Mount Allison University. The author has contributed to research in topics: Thin film & Pulsed laser deposition. The author has an hindex of 19, co-authored 30 publications receiving 864 citations. Previous affiliations of F.O. Adurodija include United States Department of Energy & Northumbria University.

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Low-temperature growth of low-resistivity indium-tin-oxide thin films by pulsed laser deposition

TL;DR: In this paper, the properties of indium-tinoxide (ITO) thin films grown on glass and silicon (Si) substrates from a 95% In 2 O 3 -5% SnO 2 sintered ceramic target by pulsed laser deposition (PLD) are compared and discussed.
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Formation of CuIn(S,Se)2 thin film by thermal diffusion of sulfur and selenium vapours into Cu–In alloy within a closed graphite container

TL;DR: In this article, the formation of thin films by thermal diffusion of sulfur (S) and selenium (Se) vapours into co-sputtered Cu-In alloy within a closed-space graphite container is reported.
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Phase formation and control of morphology in sputtered Cu–In alloy layers

TL;DR: In this paper, the dependence of structural properties and surface morphology of Cu-In alloy layers on the composition and sputtering deposition sequence were investigated by X-ray diffraction, scanning electron microscopy and energy-dispersive Xray spectroscopy.
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Characterization of CuInS 2 Thin Films Grown by Close-spaced Vapor Sulfurization of Co-sputtered Cu–In Alloy Precursors

TL;DR: In this paper, the formation of CuInS2 films was accomplished by sulfurization within a graphite container under high S vapor pressure, and X-ray diffraction (XRD) analysis of the alloy films showed predominant variation of the phases from In→CuIn2→Cu11In9 as the Cu content in the films increased.
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Pulsed Laser Deposition of Crystalline Indium Tin Oxide Films at Room Temperature by Substrate Laser Irradiation

TL;DR: In this article, the authors used pulsed laser deposition (PLD) coupled with laser irradiation of the growing indium oxide (ITO) films to achieve resistivities of 8.9×10-5 Ωcm and 2.5×10 −4 Ω cm, respectively.