Fiorenza Fanelli

TL;DR: In this article, the state of the art on scientific and technologic locks, which have to be opened to consider direct atmospheric pressure plasma-enhanced chemical vapor deposition (AP-PECVD) a viable option for industrial application, is established.

TL;DR: In this article, a critical literature review on the utilization of atmospheric pressure non-equilibrium plasma jets in surface processing of materials is provided, focusing on basic concepts and peculiarities closely related to the remote operation of the plasma sources, which include the characteristics and dynamics of the plume interacting with the substrate and the surrounding atmosphere.

TL;DR: A facile atmospheric pressure cold plasma process is presented to deposit a novel organic-inorganic hydrocarbon polymer/ZnO nanoparticles nanocomposite coating, which results in the increase the ZnO NPs content, which ultimately leads to superhydrophobic surfaces with low hysteresis due to the hierarchical multiscale roughness of the coating.

TL;DR: In this article, an overview of the state of the art in atmospheric pressure thin film deposition from fluorocarbon- or organosilicon-containing DBDs is provided, in particular the possibility of tailoring the chemical composition of the coatings, the etching-deposition competition and the influence of feed gas contaminants (i.e. air and H 2 O) in the deposition of fluoropolymers.