G
Guha Joydeep
Researcher at Lam Research
Publications - 3
Citations - 26
Guha Joydeep is an academic researcher from Lam Research. The author has contributed to research in topics: Chamber pressure & Substrate (printing). The author has an hindex of 1, co-authored 3 publications receiving 26 citations.
Papers
More filters
Patent
Systems and methods for eliminating flourine residue in a substrate processing chamber using a plasma-based process
TL;DR: In this article, a method for operating a substrate processing chamber includes after performing a process using a fluorine-based gas in the substrate chamber: a) during a first predetermined period, supplying a gas mixture to the substrate process chamber including one or more gases selected from a group consisting of molecular oxygen, molecular nitrogen, nitric oxide and nitrous oxide and supplying RF power to strike plasma.
Patent
Systems and methods for eliminating flourine residue using a plasma-based process
TL;DR: In this article, a method for operating a substrate processing chamber includes after performing a process using a fluorine-based gas in the substrate-processing chamber: a) during a first predetermined period, supplying a gas mixture to the substrateprocessing chamber including one or more gases selected from a group consisting of molecular oxygen, molecular nitrogen, nitric oxide and nitrous oxide and supplying RF power to strike plasma.
Patent
Methods for eliminating fluorine residue in a substrate processing chamber using a plasma-based process
TL;DR: In this article, a method for operating a substrate processing chamber includes after performing a process using a fluorine-based gas in the substrate chamber: a) during a first predetermined period, supplying a gas mixture to the substrate process chamber including one or more gases selected from a group consisting of molecular oxygen, molecular nitrogen, nitric oxide and nitrous oxide and supplying RF power to strike plasma.