H
Hannah Wei
Researcher at ASML Holding
Publications - 2
Citations - 65
Hannah Wei is an academic researcher from ASML Holding. The author has contributed to research in topics: Extreme ultraviolet lithography & Computational lithography. The author has an hindex of 2, co-authored 2 publications receiving 52 citations.
Papers
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Proceedings ArticleDOI
Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography
TL;DR: This paper discusses edge placement error (EPE) for multi-patterning application and compares the EPE budget with the one for EUV single expose application case and results are compared to the more straightforward alternative of using single expose patterning with EUV for all critical layers.
Proceedings ArticleDOI
Across scanner platform optimization to enable EUV lithography at the 10-nm logic node
Jan Mulkens,Jaap Karssenberg,Hannah Wei,Marcel Beckers,Leon Verstappen,Stephen Hsu,Guangqin Chen +6 more
TL;DR: This paper presents an integral method to optimize critical layer patterning across the EUV and ArF scanner platform, such that good overlay and device pattern placement is achieved.