The present invention provides methods and devices for treating the annulus of an intervertebral disc. The methods and devices can employ an expandable treatment device which is deployed at least partially in the subannular space. Fixation devices and methods are also disclosed, which help to secure the treatment device in place.

Method and apparatus for the treatment of the intervertebral disc annulus

A projection exposure apparatus for projecting a pattern formed on a first object such as a reticle upon a second object such as a semiconductor wafer by use of a projection lens system, is disclosed In the apparatus, a light of a predetermined wavelength is used for the pattern projection, and a light having a different wavelength is used to align the first and second objects by way of the projection lens system A dichroic mirror film is disposed inclinedly between the first object and the projection lens system so as to reflect one of the light of the predetermined wavelength and the light of the different wavelength, and also to transmit the other By this dichroic mirror film, the light used for the alignment and reflected back from the second object is extracted out of a light path between the first and second objects After correcting effects of chromatic aberrations of the projection lens system with respect to the different wavelength, the light for the alignment is passed through the first object By this, accurate alignment using the light of a wavelength different from that to be used for the pattern projection, is made practically attainable Also, use of lights of different wavelengths, other than the wavelength to be used for the pattern projection, is made practically attainable Thus, accurate and stable alignment is attainable regardless of the configuration of the mark provided on the second object

Projection exposure apparatus

There are disposed two homogenizers for controlling an irradiation energy density in the longitudinal direction of a laser light transformed into a linear one which is inputtted into the surface to be irradiated. Also, there is disposed one homogenizer for controlling an irradiation energy density in a width direction of the linear laser light. According to this, the uniformity of laser annealing can be improved by the minimum number of homogenizers.

Laser irradiation apparatus

The present invention provides methods and devices for annulus disc repair with and without the use of a patch or stent. The methods and devices are particularly suited to the repair and/or reconstruction of the spinal disc wall (annulus) after surgical invasion or pathologic rupture, with reduced failure rate as compared to conventional surgical procedures.

Methods and devices for spinal disc annulus reconstruction and repair

There is disclosed a technique in which stripe formation due to laser annealing is prevented and uniform laser annealing is made over the whole surface of a substrate. A laser beam having an energy distribution with an edge which has a nearly vertical shape is used, and when scanning of the laser beam is carried out, the scanning is carried out while the edge having the nearly vertical shape is made the front of the scanning.

Beam homogenizer, laser irradiation apparatus, laser irradiation method, and method of manufacturing semiconductor device

An alignment apparatus for mask and wafer each having alignment marks provided in a narrow strip like area between circuit patterns is disclosed, which mask and wafer are used in manufacturing semiconductor circuit elements. In the apparatus, the mask and wafer are scanned to obtain scan signals by means of which the amount of relative deviation between the alignment marks on mask and wafer is detected. By means of the detected signal, an alignment is effected between the mask and wafer in the apparatus. For this type of alignment apparatus, there is a problem that since the alignment marks are provided in the narrow strip like area, no coincidence between the scanning position and the strip area is attainable with pre-alignment accuracy. Improvement in the alignment apparatus according to the invention lies in that a reading of alignment marks is initiated after the coincidence is photoelectrically detected.

Alignment apparatus for mask and wafer used in manufacturing semiconductor circuit elements

This invention relates to a photo-electrical detecting apparatus for forming a dark-field image of an object on a one-dimensional image sensor and reading said image photo-electrically. The apparatus includes a telecentric objective lens, and a light source image is formed on the clear aperture plane of said lens, said image being in focus in a direction on said plane and out of focus in a perpendicular direction. A line- or band-shaped area of the object is illuminated by the light from said light source image. Thus a dark-field image of the object is formed on said one-dimensional image sensor by providing, on a plane equivalent to said aperture plane, a filter which intercepts the normal reflected light from said object and transmits the scattered light therefrom.

Photo-electrical detecting apparatus

An improved photoelectric detecting apparatus is disclosed in which a subject surface containing a pattern which diffracts light in a predetermined direction is scanned with spotlight and the diffracted light coming from the pattern is detected by means of photoelectric element so as to read out information of the pattern. The apparatus comprises a first photoelectric element for detecting the light diffracted in the predetermined direction, a second photoelectric element adapted for detecting light diffracted in directions other than the predetermined direction and an operational circuit for operating the signal derived from the first photoelectric element and that derived from the second one. Thus, when there is any diffractive matter such as flaw, dust and the like on the subject surface, diffracted light from the diffractive matter is detected by both the first and second photoelectric elements whereas diffracted light from the pattern is detected only by the first photoelectric element. By operating the outputs of the two photoelectric elements only the necessary information of the pattern can be read out.

Photoelectric detecting apparatus

A both-side printing device which adjusts the mutual position of patterns to a predetermined relation and prints the patterns on the both sides of a both-side sensitive body of a predetermined thickness, in which the relation of the mutual position of individual patterns to be formed on the both-side sensitive body can be detected prior to the both-side printing by imaging one pattern on a mask of other pattern or on a plane having the other pattern formed thereon, and thereby alignment of the two patterns can be effected.

Both-side printing device

In the system disclosed, illuminating means form an optical path. An imaging system in the optical path includes a support for a mask, an imaging lens that focuses the image of the mask onto an optical plane, and a support that holds a component having a radiation-sensitive surface at the plane. A filter in the illuminating system blocks out light capable of affecting the radiation-sensitive material but allows passage of some visible light so that the image of the mask can be seen on the component. A half-mirror or beam splitter allows light from the imaging lens to focus on the component but deflects a portion of the light coming from the component toward an analyzer that detects the alignment between the image of the mask and the component. A second half-mirror or beam splitter near the first half-mirror compensates for radial shift of the image relative to the axis of the light path caused by the first half-mirror. The analyzer as well as the half-mirrors and the filter may be removed simultaneously after alignment to allow projection masking.

Hideki Yoshinari

Papers

Alignment apparatus for mask and wafer used in manufacturing semiconductor circuit elements

Photo-electrical detecting apparatus

Photoelectric detecting apparatus

Both-side printing device

Projection masking system