R
Ryozo Hiraga
Researcher at Canon Inc.
Publications - 18
Citations - 435
Ryozo Hiraga is an academic researcher from Canon Inc.. The author has contributed to research in topics: Signal & Wafer. The author has an hindex of 10, co-authored 18 publications receiving 435 citations.
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Patent
Wafer handling apparatus and method
TL;DR: In this paper, a wafer processing apparatus, comprising a Wafer Processing Station, a key input portion for inputting wafer instructions into the processing station, and at least one portion of the portion for accommodating a carrier for carrying the wafer, is disposed at a front side of the apparatus to which the operator faces when actuating the key input component.
Patent
Vapor deposition apparatus
Mitsuo Kakei,Keijiro Nishida,Tadayoshi Kasahara,Masao Shimabayashi,Ryozo Hiraga,Tomomasa Nakano,Ichiro Komatsubara +6 more
TL;DR: In this article, a pre-heating chamber for continuous processing of optical elements is described. But the pre-heat chamber is not used for optical element deposition, instead, it is used for thin film coating on the opposite surfaces of the articles.
Patent
Alignment apparatus for mask and wafer used in manufacturing semiconductor circuit elements
Akiyoshi Suzuki,Ryozo Hiraga,Ichiro Kano,Hideki Yoshinari,Masao Totsuka,Yuzo Kato,Yasuo Ogino +6 more
TL;DR: In this paper, an alignment apparatus for mask and wafer each having alignment marks provided in a narrow strip like area between circuit patterns is disclosed, which mask and Wafer are used in manufacturing semiconductor circuit elements.
Patent
Photo-electrical detecting apparatus
TL;DR: In this paper, a photo-electrical detecting apparatus for forming a dark-field image of an object on a one-dimensional image sensor and reading said image photoelectrically is described.
Patent
Photoelectric detecting apparatus
TL;DR: In this article, an improved photoelectric detecting apparatus is disclosed in which a subject surface containing a pattern which diffracts light in a predetermined direction is scanned with spotlight and the diffracted light coming from the pattern is detected by means of photoelectric element so as to read out information of the pattern.