Hidetoshi Nishiyama

TL;DR: In this article, the authors propose an apparatus for reviewing defects including an image processing section (defect classification device section) with a function of estimating a non-defective state (reference image) of a portion in which the defect exists by use of a defect image, and a function for judging criticality or non-flat state of the defect by using the estimation result.

TL;DR: A method of inspecting detects includes assigning a plurality of sets of image acquisition conditions, executing inspection using each of the sets of conditions, classifying all detected defects into real defects and false defects by use of an automatic defect classification function, and selecting, from the plurality, a set of conditions ideal for detection.

TL;DR: In this article, a defect inspection method using a slit-shaped beam having lights substantially parallel to a longitudinal direction to a substrate having circuit patterns in a direction inclined at a predetermined gradient relative to the direction of a line normal to the substrate and inclined on a surface with respect to a group of main straight lines of the circuit patterns with its longitudinal direction oriented almost perpendicularly to a direction of movement of the substrate.

TL;DR: In this article, a defect detection system was proposed to automatically discriminate a foreign matter from a scratch by eliminating the low angle light from the high angle light and middle angle light, which can improve the working property, quality and reliability of the defect inspection.

TL;DR: In this paper, a defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, and an image processor which processes the signal.