H
Hong Deng
Researcher at University of Electronic Science and Technology of China
Publications - 46
Citations - 887
Hong Deng is an academic researcher from University of Electronic Science and Technology of China. The author has contributed to research in topics: Thin film & X-ray photoelectron spectroscopy. The author has an hindex of 12, co-authored 37 publications receiving 820 citations.
Papers
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Effects of post-thermal annealing on the optical constants of ZnO thin film
TL;DR: In this article, the optical constants of the annealed ZnO thin film were determined in the ultraviolet region while increases in the visible region, and the effects of annealing temperature on optical constants were investigated.
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Characteristics of Al-doped c-axis orientation ZnO thin films prepared by the sol-gel method
TL;DR: In this paper, a hexagonal wurtzite structure and high preferential c-axis orientation of transparent conducting ZnO thin films doped with Al have been prepared by sol-gel method, which were characterized by X-ray diffraction, atomic force microscopy and ultra-violet spectrometer.
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Ultraviolet photoconductive detector based on Al doped ZnO films prepared by sol–gel method
TL;DR: In this article, the authors report on the fabrication and characterization of ultraviolet photodetectors based on ZnO:Al thin films, having a metal-semiconductor-metal (MSM) structure with interdigital (IDT) configuration.
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Surface Work Function of Transparent Conductive ZnO Films
TL;DR: In this article, the influence of Al doped on work function of ZnO thin film with C-axis preferred orientation was analyzed both theoretically and experimentally, and it was found that the theoretical value of work function for (002) plane Zn o and Zn O:Al were 5.076ev and 4.978ev respectively.
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Properties of Al heavy-doped ZnO thin films by RF magnetron sputtering
TL;DR: In this article, X-ray diffraction and scanning electron spectrometer studies, wurtzite structure with (0-0-2) orientation ZnO thin films were obtained at Al concentration below 15 atomic percent (at%).