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Showing papers by "Hossein Sojoudi published in 2017"


Journal ArticleDOI
TL;DR: The mechanisms of the major CVD polymerization techniques and the recent progress of their applications in devices and device fabrication are discussed, with emphasis on initiated CVD (iCVD) and oxidative CVD [oCVD] polymerization.
Abstract: Chemical vapor deposition (CVD) polymerization directly synthesizes organic thin films on a substrate from vapor phase reactants. Dielectric, semiconducting, electrically conducting, and ionically conducting CVD polymers have all been readily integrated into devices. The absence of solvent in the CVD process enables the growth of high-purity layers and avoids the potential of dewetting phenomena, which lead to pinhole defects. By limiting contaminants and defects, ultrathin (<10 nm) CVD polymeric device layers have been fabricated in multiple laboratories. The CVD method is particularly suitable for synthesizing insoluble conductive polymers, layers with high densities of organic functional groups, and robust crosslinked networks. Additionally, CVD polymers are prized for the ability to conformally cover rough surfaces, like those of paper and textile substrates, as well as the complex geometries of micro- and nanostructured devices. By employing low processing temperatures, CVD polymerization avoids damaging substrates and underlying device layers. This report discusses the mechanisms of the major CVD polymerization techniques and the recent progress of their applications in devices and device fabrication, with emphasis on initiated CVD (iCVD) and oxidative CVD (oCVD) polymerization.

91 citations


Journal ArticleDOI
TL;DR: It is demonstrated how to establish omniphobicity or liquid infiltration by controlling the surface morphology and the protective character of the pPFDA coating with the potential application of these surfaces for direct contact printing of microelectronic features.
Abstract: Scalable manufacturing of structured materials with engineered nanoporosity is critical for applications in energy storage devices (i.e., batteries and supercapacitors) and in the wettability control of surfaces (i.e., superhydrophobic and superomniphobic surfaces). Patterns formed in arrays of vertically aligned carbon nanotubes (VA-CNTs) have been extensively studied for these applications. However, the as-deposited features are often undesirably altered upon liquid infiltration and evaporation because of capillarity-driven aggregation of low density CNT forests. Here, it is shown that an ultrathin, conformal, and low-surface-energy layer of poly perfluorodecyl acrylate, poly(1H,1H,2H,2H-perfluorodecyl acrylate) (pPFDA), makes the VA-CNTs robust against surface-tension-driven aggregation and densification. This single vapor-deposition step allows the fidelity of the as-deposited VA-CNT patterns to be retained during wet processing, such as inking, and subsequent drying. It is demonstrated how to establish omniphobicity or liquid infiltration by controlling the surface morphology. Retaining a crust of entangled CNTs and pPFDA aggregates on top of the patterned VA-CNTs produces micropillars with re-entrant features that prevent the infiltration of low-surface-tension liquids and thus gives rise to stable omniphobicity. Plasma treatments before and after polymer deposition remove the crust of entangled CNTs and pPFDA aggregates and attach hydroxyl groups to the CNT tips, enabling liquid infiltration yet preventing densification of the highly porous CNTs. The latter observation demonstrates the protective character of the pPFDA coating with the potential application of these surfaces for direct contact printing of microelectronic features.

34 citations


01 Nov 2017
TL;DR: In this paper, an ultrathin, conformal, and low-surface energy layer of poly perfluorodecyl acrylate, poly(1H, 1H, 2H,2H-perfluorodecyl ACrylate) (pPFDA) is applied to the patterned vertically aligned carbon nanotubes (VA-CNTs).
Abstract: Scalable manufacturing of structured materials with engineered nanoporosity is critical for applications in energy storage devices (i.e., batteries and supercapacitors) and in the wettability control of surfaces (i.e., superhydrophobic and superomniphobic surfaces). Patterns formed in arrays of vertically aligned carbon nanotubes (VA-CNTs) have been extensively studied for these applications. However, the as-deposited features are often undesirably altered upon liquid infiltration and evaporation because of capillarity-driven aggregation of low density CNT forests. Here, it is shown that an ultrathin, conformal, and low-surface-energy layer of poly perfluorodecyl acrylate, poly(1H,1H,2H,2H-perfluorodecyl acrylate) (pPFDA), makes the VA-CNTs robust against surface-tension-driven aggregation and densification. This single vapor-deposition step allows the fidelity of the as-deposited VA-CNT patterns to be retained during wet processing, such as inking, and subsequent drying. It is demonstrated how to establish omniphobicity or liquid infiltration by controlling the surface morphology. Retaining a crust of entangled CNTs and pPFDA aggregates on top of the patterned VA-CNTs produces micropillars with re-entrant features that prevent the infiltration of low-surface-tension liquids and thus gives rise to stable omniphobicity. Plasma treatments before and after polymer deposition remove the crust of entangled CNTs and pPFDA aggregates and attach hydroxyl groups to the CNT tips, enabling liquid infiltration yet preventing densification of the highly porous CNTs. The latter observation demonstrates the protective character of the pPFDA coating with the potential application of these surfaces for direct contact printing of microelectronic features.

30 citations


Journal ArticleDOI
TL;DR: In this paper, a solvent-free, low temperature (2μm) compared to bare silicon (~30μs), and remained stable in air for over 200 h. These values approach that of SiN x films deposited at significantly higher temperatures.

7 citations


Patent
06 Dec 2017
TL;DR: In this article, the authors have disclosed the methods of printing nanoparticulate ink using nanoporous print stamps, which can include a substrate, a patterned arrangement of carbon nanotubes disposed on the substrate, and a secondary material to reduce capillary-induced deformation of the pattern.
Abstract: Methods of printing nanoparticulate ink using nanoporous print stamps are disclosed. A nanoporous print stamp can include a substrate, a patterned arrangement of carbon nanotubes disposed on the substrate, and a secondary material disposed on the carbon nanotubes to reduce capillary-induced deformation of the patterned arrangement of carbon nanotubes when printing nanoparticulate ink. Some methods include loading a nanoporous print stamp with nanoparticulate colloidal ink such that the nanoparticulate colloidal ink is drawn into microstructures of the patterned arrangement of carbon nanotubes via capillary wicking. Nanoparticulate colloidal ink can include nanoparticles dispersed in a solution. The method also includes contacting a nanoporous stamp to a target substrate to form nanoscale contact points between the target substrate and the patterned arrangement of carbon nanotubes of the nanoporous print stamp so that nanoparticulate colloidal ink is drawn out of the nanoporous print stamp and onto the target substrate to form a pattern.

2 citations