Graphene-Like Two-Dimensional Materials

Chemical vapour deposition of coatings

https://iopscience.iop.org/article/10.1149/2.1441707jes/pdf

Review—SEI: Past, Present and Future

Handbook of SiC properties for fuel performance modeling

In this contribution we demonstrate a method of synthesizing a hexagonal boron nitride (h-BN) thin film by ambient pressure chemical vapor deposition on polycrystalline Ni films. Depending on the growth conditions, the thickness of the obtained h-BN film is between ∼5 and 50 nm. The h-BN grows continuously on the entire Ni surface and the region with uniform thickness can be up to 20 μm in lateral size which is only limited by the size of the Ni single crystal grains. The hexagonal structure was confirmed by both electron and X-ray diffraction. X-ray photoelectron spectroscopy shows the B/N atomic ratio to be 1:1.12. A large optical band gap (5.92 eV) was obtained from the photoabsorption spectra which suggest the potential usage of this h-BN film in optoelectronic devices.

Synthesis of Few-Layer Hexagonal Boron Nitride Thin Film by Chemical Vapor Deposition

The Refractory Carbides Interstitial Carbides, Structure and Composition Carbides of Group IV: Titanium, Zirconium, and Hafnium Carbides Carbides of Group V: Vanadium, Niobium and Tantalum Carbides Carbides of Group VI: Chromium, Molybdenum, and Tungsten Carbides Covalent Carbides: Structure and Composition Characteristics and Properties of Silicon Carbide and Boron Carbide The Refractory Nitrides Interstitial Nitrides: Structure and Composition Interstitial Nitrides: Properties and General Characteristics Covalent Nitrides: Composition and Structure Covalent Nitrides: Properties and General Characteristics Processing of Refractory Carbides and Nitrides (Powder, Bulk, and Fibers) Processing of Refractory Carbides and Nitrides (Coatings) Applications of Refractory Carbides and Nitrides

Handbook of Refractory Carbides and Nitrides: Properties, Characteristics, Processing and Applications

The chemical vapor deposition of carbon on carbon fibers

Composites of boron nitride (BN) have been made by the chemical vapor deposition (CVD) of a BN matrix on a BN felt fiber substrate. Reactant gases were boron trifluoride and ammonia. The composites have a relatively high density (1.70 g/cm3), a crystallite size LC = 150 A and an interlayer spacing d002 = 3.35 A. Measurements of elastic modulus and thermal conductivity and expansion showed some anisotropy as a result of the preferred fiber orientation of the substrate.

Boron Nitride Composites By Chemical Vapor Deposition

Publisher Summary
This chapter discusses the fundamental aspects of the chemical vapor deposition (CVD) technology combining several scientific and engineering disciplines including thermodynamics, plasma physics, kinetics, and fluid dynamics. CVD is a synthesis process in which the chemical constituents react in the vapor phase near or on a heated substrate to form a solid deposit. A CVD reaction is governed by thermodynamics and kinetics. It may occur in the gas phase instead of at the substrate surface if the supersaturation of the reactive gases and the temperature are sufficiently high. This proves to be detrimental as the gas-phase precipitated particles, in the form of soot, become incorporated in the deposit, causing nonuniformity in the structure, surface roughness, and poor adhesion. A film is formed on a surface by CVD considering three important factors that control the nature and properties of the deposit to some degree. These factors are: epitaxy, gas-phase precipitation, and thermal expansion. The epitaxial CVD of silicon III–V and II–VI compounds is a major process in the semiconductor industry and plays an important part in improving the performance of the semiconductor and optoelectronic designs.

Hugh O. Pierson

Papers

Handbook of Refractory Carbides and Nitrides: Properties, Characteristics, Processing and Applications

The chemical vapor deposition of carbon on carbon fibers

Boron Nitride Composites By Chemical Vapor Deposition

2 – Fundamentals of Chemical Vapor Deposition

13 – CVD Diamond