This review describes recent groundbreaking results in Si, Si/SiGe, and dopant-based quantum dots, and it highlights the remarkable advances in Si-based quantum physics that have occurred in the past few years. This progress has been possible thanks to materials development of Si quantum devices, and the physical understanding of quantum effects in silicon. Recent critical steps include the isolation of single electrons, the observation of spin blockade, and single-shot readout of individual electron spins in both dopants and gated quantum dots in Si. Each of these results has come with physics that was not anticipated from previous work in other material systems. These advances underline the significant progress toward the realization of spin quantum bits in a material with a long spin coherence time, crucial for quantum computation and spintronics.

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Silicon quantum electronics

Nanocrystals (NCs), representing a zero-dimensional system, are an ideal platform for exploring quantum phenomena on the nanoscale, and are expected to play a major role in future electronic and photonic devices. Here we review recent progress in the growth, characterization and utilization of some group-IV semiconductors (Si and Ge), metal and high-k NCs for silicon planar technology compatible light-emitting and floating gate memory devices. We first introduce the size-dependent electrical and optical properties of Si and Ge NCs. We outline some of the schemes to achieve light emission from indirect band gap Si and Ge NCs embedded in different high band gap oxide matrices. In particular, special emphasis is given on the review of the advances in Ge NCs because of some of their intriguing electronic and optical properties. We then describe the use of semiconductor and metal NCs as floating gates for non-volatile memory devices to achieve high data retention and faster program/erase speeds. The exploitation of high-k oxides with tunable and variable injection barriers for improved charge storage devices is discussed. Finally, the integration of single and multilayer metallic NCs and multilayer high-k oxides as floating gates is explored by the fabrication and testing of memory transistors.

https://iopscience.iop.org/article/10.1088/0022-3727/46/15/153001/pdf

Nanocrystals for silicon-based light-emitting and memory devices

In this review, we describe recent progress made in the study of nanoparticles characterized by scanning tunneling microscopy (STM) and scanning tunneling spectroscopy (STS). Basic principles of STM measurements and single-electron tunneling phenomena through a single NP are summarized. We highlight the results of electrical and photonic properties on NPs studied by STM and STS. Because nanoparticles are single-digit nanometre in diameter, a single-electron transport on individual nanoparticles such as Coulomb blockade and resonant tunneling through discrete energy levels are investigated. Photon-emission from NPs is also introduced based on STM measurements. Novel single-nanoparticle functions such as stochastic blinking and one-write erasing behaviours are presented. This review provides an overview of nanoparticle characterization methods based on STM and STS that include the detailed understanding of the electrical and photonics properties of nanoparticles.

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Nanoparticle characterization based on STM and STS

We report on transport measurement performed on a room-temperature-operating ultrasmall Coulomb blockade devices with a silicon island of sub5 nm. The charge stability at 300K exhibits a substantial change in slopes and diagonal size of each successive Coulomb diamond, but remarkably its main feature persists even at low temperature down to 5.3K except for additional Coulomb peak splitting. This key feature of charge stability with additional fine structures of Coulomb peaks are successfully modeled by including the interplay between Coulomb interaction, valley splitting, and strong quantum confinement, which leads to several low-energy many-body excited states for each dot occupancy. These excited states become enhanced in the sub5 nm ultrasmall scale and persist even at 300K in the form of cluster, leading to the substantial modulation of charge stability.

Room-Temperature Charge Stability Modulated by Quantum Effects in a Nanoscale Silicon Island

We report the electronic transport on n-type silicon single electron transistors (SETs) fabricated in complementary metal oxide semiconductor (CMOS) technology. The n-type metal oxide silicon SETs (n-MOSSETs) are built within a pre-industrial fully depleted silicon on insulator (FDSOI) technology with a silicon thickness down to 10 nm on 200 mm wafers. The nominal channel size of 20 × 20 nm(2) is obtained by employing electron beam lithography for active and gate level patterning. The Coulomb blockade stability diagram is precisely resolved at 4.2 K and it exhibits large addition energies of tens of meV. The confinement of the electrons in the quantum dot has been modeled by using a current spin density functional theory (CS-DFT) method. CMOS technology enables massive production of SETs for ultimate nanoelectronic and quantum variable based devices.

https://iopscience.iop.org/article/10.1088/0957-4484/23/21/215204/pdf

Few electron limit of n-type metal oxide semiconductor single electron transistors

An ultrasmall single-electron transistor has been made by scaling the size of a fin field-effect transistor structure down to an ultimate limiting form, resulting in the reliable formation of a sub-5 nm Coulomb island. The charge stability data feature the first exhibition of three and a half clear Coulomb diamonds at 300 K, each showing a high peak-to-valley current ratio. Its charging energy is estimated to be more than one order magnitude larger than the thermal energy at room-temperature. The hybrid literal gate integrated by this single-electron transistor combined with a field-effect transistor displays >5 bit multiswitching behavior at 300 K with a large voltage swing of ∼1 V.

https://eprints.lib.hokudai.ac.jp/dspace/bitstream/2115/49549/3/APL97-10_103101.pdf

J. B. Choi

Papers

Si-based ultrasmall multiswitching single-electron transistor operating at room-temperature