The transport properties of disordered solids have been the subject of much work since at least the 1950s, but with a new burst of activity during the 1980s which has survived up to the present day. There have been numerous reviews of a more or less specialized nature. The present review aims to fill the niche for a non-specialized review of this very active area of research. The basic concepts behind the theory are introduced with more detailed sections covering experimental results, one-dimensional localization, scaling theory, weak localization, magnetic field effects and fluctuations.

https://iopscience.iop.org/article/10.1088/0034-4885/56/12/001/pdf

Localization: theory and experiment

This review describes recent groundbreaking results in Si, Si/SiGe, and dopant-based quantum dots, and it highlights the remarkable advances in Si-based quantum physics that have occurred in the past few years. This progress has been possible thanks to materials development of Si quantum devices, and the physical understanding of quantum effects in silicon. Recent critical steps include the isolation of single electrons, the observation of spin blockade, and single-shot readout of individual electron spins in both dopants and gated quantum dots in Si. Each of these results has come with physics that was not anticipated from previous work in other material systems. These advances underline the significant progress toward the realization of spin quantum bits in a material with a long spin coherence time, crucial for quantum computation and spintronics.

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Silicon quantum electronics

I. Introduction (Preface, Nanostructures in Si Inversion Layers, Nanostructures in GaAs-AlGaAs Heterostructures, Basic Properties). 
II. Diffusive and Quasi-Ballistic Transport (Classical Size Effects, Weak Localization, Conductance Fluctuations, Aharonov-Bohm Effect, Electron-Electron Interactions, Quantum Size Effects, Periodic Potential). 
III. Ballistic Transport (Conduction as a Transmission Problem, Quantum Point Contacts, Coherent Electron Focusing, Collimation, Junction Scattering, Tunneling). 
IV. Adiabatic Transport (Edge Channels and the Quantum Hall Effect, Selective Population and Detection of Edge Channels, Fractional Quantum Hall Effect, Aharonov-Bohm Effect in Strong Magnetic Fields, Magnetically Induced Band Structure).

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Quantum Transport in Semiconductor Nanostructures

Publisher Summary Quantum transport is conveniently studied in a two-dimensional electron gas (2DEG) because of the combination of a large Fermi wavelength and large mean free path. Semiconductor nanostructures are unique in offering the possibility of studying quantum transport in an artificial potential landscape. This is the regime of ballistic transport in which scattering with impurities are neglected. The chapter presents a self-contained account of these three novel transport regimes in semiconductor nanostructures. The study of quantum transport in semiconductor nanostructures is motivated by more than scientific interest. The fabrication of nanostructures relies on sophisticated crystal growth and lithographic techniques that exist because of the industrial effort toward the miniaturization of transistors. Conventional transistors operate in the regime of classical diffusive transport, which breaks down on short length scales. The discovery of novel transport regimes in semiconductor nanostructures provides options for the development of innovative future devices.

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We present low-temperature electrical transport experiments in five field-effect transistor devices consisting of monolayer, bilayer, and trilayer MoS(2) films, mechanically exfoliated onto Si/SiO(2) substrate. Our experiments reveal that the electronic states in all films are localized well up to room temperature over the experimentally accessible range of gate voltage. This manifests in two-dimensional (2D) variable range hopping (VRH) at high temperatures, while below ∼30 K, the conductivity displays oscillatory structures in gate voltage arising from resonant tunneling at the localized sites. From the correlation energy (T(0)) of VRH and gate voltage dependence of conductivity, we suggest that Coulomb potential from trapped charges in the substrate is the dominant source of disorder in MoS(2) field-effect devices, which leads to carrier localization, as well.

Nature of electronic states in atomically thin MoS₂ field-effect transistors.

Measurements of the temperature and carrier-density dependence of the strongly localized conductance of short silicon inversion layers are reported. At the lowest temperatures we observe well-isolated, large conductance peaks whose width and temperature dependence are only consistent with resonant tunneling and are inconsistent with Mott hopping. Several new features are observed which we believe may be the result of Coulomb interactions.

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Observation of resonant tunneling in silicon inversion layers.

We have made extensive studies of the temperature, gate voltage, and electric field dependences of the conductance peaks in small silicon inversion layers in order to distinguish between resonant-tunneling models and a hopping model. We find that many of the peaks are consistent only with a hopping model, whereas some could be consistent with an early resonant-tunneling model. None of our structure is consistent with resonant tunneling if the recent formulation of Stone and Lee is correct.

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Origin of the Peaked Structure in the Conductance of One-Dimensional Silicon Accumulation Layers

We review some recent results on the low-temperature transport properties (T < 4K) of very small silicon metal-oxide field-effect transistors in the insulating regime of conduction. Our devices are lithographically patterned to have widths as small as 0.05 µm and lengths as short as 0.06 µm. These small transistors exhibit new and unexpected sample-specific fluctuation behavior in the gate voltage, temperature, and magnetic field dependence of the conductance. We discuss both resonant tunneling and Mott variable-range hopping, the two main transport mechanisms in these devices at low temperature.

J.J. Wainer

Papers

Observation of resonant tunneling in silicon inversion layers.

Origin of the Peaked Structure in the Conductance of One-Dimensional Silicon Accumulation Layers

Electronic transport in small strongly localized structures

One-dimensional conductance in silicon mosfet's

Hopping conduction in quasi-one-dimensional systems