This paper presents the properties of the Sigma7300 which is a commercial DUV laser pattern generator based on spatial light modulator (SLM) technology designed to meet the requirements of the 65-nm technology node and below. The introduction of spatial light modulators provides a possibility for optical mask writers to combine high resolution and accuracy with short write time making it possible to write most of the high end mask layers in a cost effective way. The Sigma7300 mask writer is developed by Micronic Laser Systems whereas the SLM, which is a combined MEMS and CMOS component with individually controllable movable micromirrors, is developed by the Fraunhofer-IPMS institute in Dresden. The SLM allows parallel writing of one million pixels with a frame rate of up to 2 kHz. The technology offers resolution enhancement advantages from stepper technology not available in other mask patterning tools.

A high-end mask writer using a spatial light modulator

Phase shifting mask (PSM) development activity is increasing as 193nm optical lithography is extended beyond the 90nm technology node. The requirements on second level mask patterning of advanced PSM have for many applications exceeded the capability of i-line pattern generators, and it is natural for deep-ultraviolet (DUV) pattern generators to be employed for this task. The Sigma7300 DUV mask writer has the attributes required for advanced PSM applications: high resolution, tight CD uniformity and pattern placement, an accurate alignment system, and grid matching to first level exposures. The paper reports system performance for the parameters that constitute the error budget for second level patterning and shows that the mask writer is suitable for second level patterning of advanced PSMs. The alignment system employs the same laser and optics that are used for system calibration and exposure, including a CCD camera that links system calibration to alignment. As a result overlay performance is stable, and is shown to be independent of alignment mark image contrast changes due to different mask materials or resist thicknesses. The mask process uses a conventional chemically amplified resist, and does not require the use of charge dissipating top layers. Combined with throughput that is essentially independent of pattern complexity, DUV pattern generation provides a high yield solution for second level patterning of advanced PSMs for the 65nm and 45nm nodes.

Second level exposure for advanced phase shift mask applications using the SLM-based Sigma7300 DUV mask writer

As photomask pattern complexity continues to increase, it becomes more challenging to control write times of shaped e-beam tools. This raises the related concerns of increased mask costs and extended mask cycle times. A strategy for sub-100 nm technology nodes is to use high-speed DUV laser pattern generators for as many layers as possible, reserving e-beam tools for only the most critical layers. With 248 nm optics and high-NA partially coherent imaging, the Sigma7500 increases the application space available to laser pattern generators. Image profiles are steepened with phase shifting methods, and pattern fidelity is improved with on-line corner enhancement. In the Sigma architecture, mask patterns are imaged with full fidelity and addressability in each writing pass. Because of this, the Sigma7500 provides additional means to improve write time by reducing the number of exposure passes. Platform improvements have resulted in a 2-pass writing accuracy that meets the 4-pass specification of the previous system. Write time is typically under two hours in 2-pass mode, compared to approximately three hours for 4-pass. The Sigma7500 can generally be used for all binary mask layers at the 90 nm technology node, and for about half the layers at 45 nm. The ProcessEqualizer TM function addresses long range CD errors arising from mask process effects. Mask data is sized in real time to compensate for process errors related to local pattern density, and also to correct for static process CD signatures. With a through-the-lens alignment system and both grid matching and pattern matching capabilities, the tool is also suited to 2 nd layer patterning for advanced phase shifting mask (PSM) applications down to 45 nm, with extendibility to 32 nm. Process integration is facilitated by the use of standard FEP-171 chemically amplified resist (CAR).

Sigma7500: an improved DUV laser pattern generator addressing sub-100-nm photomask accuracy and productivity requirements

Phase shift mask (PSM) applications are becoming essential for addressing the lithography requirements of the 65 nm technology node and beyond. Many mask writer properties must be under control to expose the second level of advanced PSM: second level alignment system accuracy, resolution, pattern fidelity, critical dimension (CD) uniformity and registration. Optical mask writers have the advantage of process simplicity for this application, as they do not require a discharge layer. This paper discusses how the mask writer properties affect the error budget for printing the second level. A deep ultraviolet (DUV) mask writer with a spatial light modulator (SLM) is used in the experimental part of the paper. Partially coherent imaging optics at the 248 nm wavelength provide improved resolution over previous systems, and pattern fidelity is optimized by a real-time corner enhancement function. Lithographic performance is compared to the requirements for second level exposure of advanced PSM. The results indicate sufficient capability and stability for 2nd level alternating PSM patterning at the 65 nm and 45 nm nodes.

Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

SLM-based DUV laser writers are gaining acceptance for 2 nd level PSM and binary mask patterning These writers can use an e-beam compatible resist enabling tool and process sharing For binary mask patterning, critical metrics include: critical dimension uniformity (CDU), CD targeting, mask registration, defect performance and inspectability For PSM applications, pattern fidelity matching to 1 st level and PSM overlay are also important A Sigma7300 is being integrated into 65nm and 45nm production Binary and PSM mask performance data will be presented Tool self metrics to characterize SLM health will also be presented Data conversion, data preparation and production write times will be discussed

Production performance of a Sigma7300 DUV mask writer

This paper presents the properties of a second-generation DUV laser pattern generator based on spatial light modulator technology and designed to meet the requirements of the 90-nm to 65-nm technology nodes. The system, named Sigma7300, is described and major changes compared to its predecessor are pointed out. These changes result in improved pattern accuracy and fidelity as well as system reliability and maintenance. This improved performance is accompanied with greatly reduced writing times of typically 3 Hrs. per mask. Performance data is presented that shows the system meets the resolution requirement of 260 nm with CD linearity of 10 nm and assist line resolution of 140 nm. CD uniformity data and registration data are also presented that indicates that the system meets the requirements for most layers at the 90-nm and 65-nm nodes.

Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes

With each new technology generation, photomask manufacturing faces increasing complexity due to shrinking designs and accelerating use of reticle enhancement techniques. Denser and more complex patterns on the mask result in lower yields and long write and turn-around times, important factors for the rapidly increasing mask related costs in IC manufacturing. Laser pattern generators operating at DUV wavelengths were recently introduced to provide cost effective alternatives to electron-beam systems for printing of high-end photomasks. DUV wavelengths provide the required resolution and pattern fidelity. Optical tools that use raster writing principles and massively parallel printing ensure short and predictable write times for photomasks almost independent of pattern complexity.
One such high-volume production system, the Sigma7300, uses spatial light modulator (SLM) technology and a 248 nm excimer laser for printing. Partially coherent imaging and multi-pass printing as in a lithography scanner further increases resolution and pattern accuracy. With four-pass printing the system provides resolution and pattern accuracy meeting mask requirements for critical layers at the 90-nm node and sub-critical layers at the 65-nm node and beyond. 
The paper discusses how mask layout can be optimized to take full advantage of the speed potential provided by the SLM-based writer. It shows how flexible use of the writing principle can provide cost effective writing solutions for many layers in high-end mask sets. Resolution and pattern accuracy results from the Sigma7300 will be presented together with write times for different types of designs.

Jan Harkesjo

Papers

Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes

Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator