The invention relates to a method for complete inactivation of tantalum powder obtained after heat treatment. The method is characterized in that tantalum powder caking, subject to heat treatment and inactivation, in a vacuum heat treatment furnace and a crucible containing the tantalum powder are placed in a sealed container, under the controllable oxygen concentration, the tantalum powder caking is peeled out of the crucible, the caking is smashed and sieved, and the tantalum powder is subject to complete inactivation. The invention further provides a device for complete inactivation of tantalum powder. The tantalum powder prepared through the method is low in oxygen content, and the fire accident caused when the tantalum powder is peeled out of the crucible and is smashed and sieved is avoided.

Method and device for complete inactivation of tantalum powder

The invention relates to a vanadium, chrome and titanium alloy plate and a preparation method thereof, and belongs to the technical field of metal plastic machining. The vanadium, chrome and titanium alloy plate is composed of, by weight, 88-94% of V, 2.9-6% of Cr, 2.6-6% of Ti and the balance not more than 0.5% of inevitable impurities. The vanadium, chrome and titanium alloy plate is prepared by sequentially conducting ingot casting homogenizing annealing, pancake forging, hammer cogging, pancake hot rolling, cold rolling, solid solution and aging treatment, argon filling cooling following a furnace and other procedures with alloy ingots prepared through the metallothermics and the vacuum induction refining method as blanks. The obtained V-Cr-Ti alloy plate is small in crystalline grain, uniform in component, good in surface quality and excellent in performance.

Vanadium, chrome and titanium alloy plate and preparation method thereof

The invention provides a method for manufacturing a thin-wall metal semi-spherical shell with a seam allowance. The method comprises the steps of machining a solid metal ball, grinding and polishing the metal ball by adopting a four-axis ball body grinding method, cutting a metal semi-spherical shell through WEDM (Wire cut Electrical Discharge Machining), processing an inner semi-spherical surface by adopting EDM (Electrical Discharge Machining), correcting the wall thickness of the semi-spherical shell through a micro-CT and a small semi-spherical surface grinding technology, processing the seam allowance through EDM-mill, and obtaining the thin-wall difficult-to-process metal semi-spherical shell with the seam allowance. By adopting the method provided by the invention, the processing on an ultra-hard difficult-to-process metal material can be realized.

Method for manufacturing thin-wall metal semi-spherical shell with seam allowance

The present invention relates to a high-purity tantalum powder and a preparation method therefore. The tantalum powder has a purity of more than 99.995%, as analyzed by GDMS. Preferably, the tantalum powder has an oxygen content of not more than 1000 ppm, a nitrogen content of not more than 50 ppm, a hydrogen content of not more than 20 ppm, a magnesium content of not more than 5 ppm, and an average particle diameter D50 of less than 25 µm.

High-purity tantalum powder and preparation method therefor

The invention discloses a novel helium ion sputtering-resistant vanadium alloy. The problem of low helium ion sputtering resistance of the prior art is solved. The alloy comprises the following components in percentage by weight: 3.0 to 6.5 percent of Cr, 3.0 to 6.5 percent of Ti, 0.1 to 2.0 percent of Y and the balance of V. In addition, the invention further provides a method for preparing the alloy. According to the vanadium alloy, on the basis of a V-Cr-Ti ternary alloy system, Cr and Ti are employed as main alloy elements, the rare earth element Y is added to reduce the content of solid solution oxygen in the vanadium alloy and reduce the dimensions of ingot crystals by virtue of a simple alloying means, and a plastic deformation machining means is combined to disperse and distribute yttrium oxide with stable high-temperature performance on a substrate and remarkably reduce and uniformize the dimensions of the annealed alloy crystals, thereby improving the toughness of the alloy and greatly enhancing the helium ion sputtering resistance of the alloy.

Novel helium ion sputtering-resistant vanadium alloy and preparation method thereof

The invention relates to a heat treatment method for nanometer tantalum powder. A tap density meter is used for carrying out tapping treatment on the nanometer tantalum powder before nanometer conglomeration treatment, so the preparation of tantalum powder blank blocks is not needed. Compared with the prior art with the treatment capability of 0.9g nanometer tantalum powder every time, the method provided by the invention has the advantages that 100 to 200g of nanometer tantalum powder can be treated every time, the treatment efficiency is greatly improved, meanwhile, the oxygen content of the obtained conglomerated nanometer tantalum powder is lower than 0.1 percent, the requirement that a tantalum capacitor requires the oxygen content of the tantalum powder being lower than 0.3 percent can be completely met, and the engineering production can be favorably realized. Compared with tantalum powder blank blocks in the prior art, the tantalum powder subjected to the tapping treatment has the advantages that the density and the hardness of blank blocks obtained after the heat treatment are low, before the deoxygenation treatment, the crushing treatment is not needed, the generation of tantalum powder sharp corners is avoided, and the adverse influence on the subsequent tantalum capacitor manufacturing and the capacitance volume is eliminated.

Thermal treatment method for nanometer tantalum powder

The invention relates to a manufacturing process of a V-Cr-Ti alloy super-hemispherical shell. The V-Cr-Ti alloy super-hemispherical shell mainly comprises the following components by weight percent: 4-5% of chrome, 4-5% of titanium and the balance being vanadium and unavoidable impurities. The manufacturing process comprises the following steps that: the spherical shell blank prefabricated by melting the component powder is subjected to hot isostatic pressing at a temperature of 1000 to 1200 DEG C, and heated at a temperature of 900 to 1200 DEG C for 0.5 to 1 hour, and then the forging molding of the super-hemispherical shell is carried out by using a 0.75 tons-2 tons free forging hammer; and the super-hemispherical shell is subjected to heat treatment at a temperature of 800 to 1100 DEG C for 0.5 to 5 hours, and is cooled at a cooling rate of 50-100 DEG C / hour and annealed at a temperature of 600 to 700 DEG C. The super-hemispherical shell prepared by the process has low activation properties and excellent high temperature strength under neutron irradiation conditions, and also has good resistance to radiation mutagenesis expansion and radiation damage, good dimensional stability, high thermal conductivity, lower elastic modulus, low biohazard, good creep resistance, good workability and the like.

Manufacturing process of V-Cr-Ti alloy super-hemispherical shell

A combined mold for pouring comprises a body provided with mold cavities inside and is characterized in that mold set plug-ins are detachably installed on the body, and the mold cavities are molded in the mold set plug-ins. Further, the body comprises an upper platen, a lower platen and supporting columns, the supporting columns are arranged between the upper platen and the lower platen, and the mold set plug-ins are detachably installed on the upper platen. Compared with the prior art, the combined mold for pouring has the advantages that products in different shapes and specifications can be produced through matching of the same body with mold set plug-ins in different models, and the cost and energy for producing a plurality of molds can be saved.

Combined mold for pouring

A preparation method of porous copper with a high porosity in a thin walled tube shape is characterized by comprising the following steps: preparing ball-shaped copper powder and a binding agent according to a volume percentage of 50%-60%:50%-40%, heating the binding agent to a temperature of 80 to 95 DEG C, when the binding agent is totally melted, adding the ball-shaped copper powder, mixing at a temperature of 80 to 95 DEG C for 1 to 1.5 hours, pouring the fluid mixture into a cavity of a mould with a temperature of 80 to 90 DEG C, forming so as to obtain a blank, cooling, demoulding; placing the formed blank into a degreasing furnace, burying the blank into Al2O3 powder, in the protection of hydrogen gas, heating to a temperature of 45 to 55 DEG C at a heating speed of 8 to 12 DEG C per minute, maintaining the temperature for 20 to 40 minutes, heating to a temperature of 210 to 230 DEG C at a heating speed of 1 to 3 DEG C per minute, maintaining the temperature for 1 to 4 hours, heating to a temperature of 810 to 890 DEG C at a heating speed of 8 to 12 DEG C per minute, and sintering for 1 to 3 hours. The defects that mould forming is difficult to achieve after the addition of a pore-forming agent and the sintering manufacture cost is high are solved; the prepared porous copper in a thin walled tube shape can obtain a perforated structure, and moreover the preparation method has the advantages of simple technology and low manufacture cost.

Jia Wanming

Papers

Thermal treatment method for nanometer tantalum powder

Manufacturing process of V-Cr-Ti alloy super-hemispherical shell

Combined mold for pouring

Preparation method of porous copper with high porosity in thin walled tube shape