The invention relates to a method for complete inactivation of tantalum powder obtained after heat treatment. The method is characterized in that tantalum powder caking, subject to heat treatment and inactivation, in a vacuum heat treatment furnace and a crucible containing the tantalum powder are placed in a sealed container, under the controllable oxygen concentration, the tantalum powder caking is peeled out of the crucible, the caking is smashed and sieved, and the tantalum powder is subject to complete inactivation. The invention further provides a device for complete inactivation of tantalum powder. The tantalum powder prepared through the method is low in oxygen content, and the fire accident caused when the tantalum powder is peeled out of the crucible and is smashed and sieved is avoided.

Method and device for complete inactivation of tantalum powder

The present invention relates to a high-purity tantalum powder and a preparation method therefore. The tantalum powder has a purity of more than 99.995%, as analyzed by GDMS. Preferably, the tantalum powder has an oxygen content of not more than 1000 ppm, a nitrogen content of not more than 50 ppm, a hydrogen content of not more than 20 ppm, a magnesium content of not more than 5 ppm, and an average particle diameter D50 of less than 25 µm.

High-purity tantalum powder and preparation method therefor

The invention relates to a method for preparing target-level high-purity tantalum powder. According to the method for preparing the target-level high-purity tantalum powder, a block-shaped mixture of tantalum powder prepared through potassium fluotantalate sodium reduction and one or more of diluted slats including NaCl, KCl and KF is filtered and washed with pure water, when the conductivity of filtering and washing liquid is smaller than 5000 us/cm, the filtered and washed mixture is poured into a horizontal type ball mine for wet-type ball milling, the mixture is taken out, acid pickling, suction filtration and drying are conducted on the mixture, so that raw tantalum powder is obtained, thermal treatment, oxygen reduction, oxygen-reduction acid pickling, secondary drying and detection are conducted on the raw tantalum powder, and then the target-level high-purity tantalum powder is obtained. According to the method for preparing target-level high-purity tantalum powder, the technology is simple, the production cost is low, the tantalum powder prepared according to the method is large in apparent density, high in purity, low in oxygen content and capable of meeting the requirement of a target for the purity and the density of materials, and therefore tantalum target cost and tantalum alloy target cost are greatly reduced.

Method for preparing target-level high-purity tantalum powder

Preparation of high-purity tantalum powder

The embodiment of the invention provides a preparation method of a solid buoyancy material. The preparation method comprises the following steps: firstly, obtaining a raw material mixture for preparing the solid buoyancy material; secondly, ramming and molding the raw material mixture under the vacuum conditions to obtain a green body; thirdly, carrying out solidification treatment on the green body to obtain the solid buoyancy material. According to the preparation method of the solid buoyancy material provided by the invention, the solid buoyancy material prepared by an innovative technologyof ramming and molding under the vacuum conditions is accidently found to obtain smaller water absorption rate and improve the quality of a product.

Preparation method of solid buoyancy material

The invention relates to a heat treatment method for nanometer tantalum powder. A tap density meter is used for carrying out tapping treatment on the nanometer tantalum powder before nanometer conglomeration treatment, so the preparation of tantalum powder blank blocks is not needed. Compared with the prior art with the treatment capability of 0.9g nanometer tantalum powder every time, the method provided by the invention has the advantages that 100 to 200g of nanometer tantalum powder can be treated every time, the treatment efficiency is greatly improved, meanwhile, the oxygen content of the obtained conglomerated nanometer tantalum powder is lower than 0.1 percent, the requirement that a tantalum capacitor requires the oxygen content of the tantalum powder being lower than 0.3 percent can be completely met, and the engineering production can be favorably realized. Compared with tantalum powder blank blocks in the prior art, the tantalum powder subjected to the tapping treatment has the advantages that the density and the hardness of blank blocks obtained after the heat treatment are low, before the deoxygenation treatment, the crushing treatment is not needed, the generation of tantalum powder sharp corners is avoided, and the adverse influence on the subsequent tantalum capacitor manufacturing and the capacitance volume is eliminated.

Shi Honggang

Papers

Thermal treatment method for nanometer tantalum powder