J
John F. Evans
Researcher at University of Minnesota
Publications - 68
Citations - 1619
John F. Evans is an academic researcher from University of Minnesota. The author has contributed to research in topics: Thin film & X-ray photoelectron spectroscopy. The author has an hindex of 25, co-authored 68 publications receiving 1596 citations.
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Journal ArticleDOI
Ultrahigh vacuum metalorganic chemical vapor deposition growth and in situ characterization of epitaxial TiO2 films
Samuel Chen,Samuel Chen,M. G. Mason,M. G. Mason,H. J. Gysling,H. J. Gysling,G. R. Paz‐Pujalt,G. R. Paz‐Pujalt,Thomas N. Blanton,T. Castro,K. M. Chen,C. P. Fictorie,Wayne L. Gladfelter,Alfonso Franciosi,Philip I. Cohen,John F. Evans +15 more
TL;DR: In a two-chamber ultrahigh vacuum system, epitaxial TiO2 thin films have been deposited by metalorganic chemical vapor deposition on single crystal oxide substrates over a temperature range of 250-800°C, using titanium (IV) isopropoxide as the precursor.
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Topochemical Control in the Solid-State Conversion of Cyclotrigallazane into Nanocrystalline Gallium Nitride
Jen Wei Hwang,John P. Campbell,Jan Kozubowski,Scott A. Hanson,John F. Evans,Wayne L. Gladfelter +5 more
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Segment Level Chemistry and Chain Conformation in the Reactive Adsorption of Poly(methyl methacrylate) on Aluminum Oxide Surfaces
K. Konstadinidis,B. Thakkar,Arup K. Chakraborty,L. W. Potts,Rina Tannenbaum,M. Tirrell,John F. Evans +6 more
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EC catalysis of ascorbic acid oxidation using plasma polymerized vinylferrocene film electrodes
Mino F. Dautartas,John F. Evans +1 more
TL;DR: The use of radio frequency plasma discharges of neat vinylferrocene to chemically modify pyrolytic graphite electrode surfaces is discussed in this paper, where the results indicate that the surface composition varies as a function of placement of the substrate in the plasma reactor.