J
Joseph William Buckfeller
Researcher at Agere Systems
Publications - 15
Citations - 386
Joseph William Buckfeller is an academic researcher from Agere Systems. The author has contributed to research in topics: Wafer & Layer (electronics). The author has an hindex of 8, co-authored 15 publications receiving 386 citations. Previous affiliations of Joseph William Buckfeller include Texas Instruments & Alcatel-Lucent.
Papers
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Patent
Method of mass flow control flow verification and calibration
William Daniel Bevers,Joseph William Buckfeller,James L Flack,Robert Francis Jones,Bennett J Ross +4 more
TL;DR: In this paper, a method and apparatus for monitoring or calibrating a gas flow rate through a mass flow controller, for example, in a semiconductor fabrication process, is presented.
Patent
MODULATED DEPOSITION PROCESS FOR STRESS CONTROL IN THICK TiN FILMS
TL;DR: In this paper, a multi-layer TiN film with reduced tensile stress and discontinuous grain structure is described. But the method of fabricating the TiN films is not described.
Patent
Method and system for eliminating extrusions in semiconductor vias
Steven Mark Anderson,Siddhartha Bhowmik,Joseph William Buckfeller,Sailesh Mansinh Merchant,Frank Minardi +4 more
TL;DR: In this article, a system and method for eliminating interconnect extrusions in vias that are formed during ionized metal plasma processing is presented, where the interconnect temperature is controlled by using an actively cooled pedestal in combination with a low temperature IMP deposition process.
Patent
Bypass loop gas flow calibration
William Daniel Bevers,Robert Francis Jones,Bennett J Ross,Joseph William Buckfeller,James L Flack +4 more
TL;DR: In this article, apparatuses, methods and systems to monitor the performance of one or more mass flow controllers that supply gases to deposition, etching, and other manufacturing processes are described.
Patent
Plasma confinement shield
TL;DR: In this article, dressed edges on the apertures found in the shield are provided to reduce defect density on processed wafers and eliminate the need for frequent cleaning of the reactor chamber.